Macro And Microfluidic Flows For Skeletal Regenerative Medicine,
2012
University of Nebraska-Lincoln
Macro And Microfluidic Flows For Skeletal Regenerative Medicine, Brandon D. Riehl, Jung Yul Lim
Department of Mechanical and Materials Engineering: Faculty Publications
Fluid flow has a great potential as a cell stimulatory tool for skeletal regenerative medicine, because fluid flow-induced bone cell mechanotransduction in vivo plays a critical role in maintaining healthy bone homeostasis. Applications of fluid flow for skeletal regenerative medicine are reviewed at macro and microscale. Macroflow in two dimensions (2D), in which flow velocity varies along the normal direction to the flow, has explored molecular mechanisms of bone forming cell mechanotransduction responsible for flow-regulated differentiation, mineralized matrix deposition, and stem cell osteogenesis. Though 2D flow set-ups are useful for mechanistic studies due to easiness in in situ and post-flow …
Polymeric Nanocarriers For The Regional And Systemic Delivery Of Therapeutics To And Through The Lungs,
2012
Wayne State University
Polymeric Nanocarriers For The Regional And Systemic Delivery Of Therapeutics To And Through The Lungs, Balaji Bharatwaj
Wayne State University Dissertations
The lungs are considered as one of the fastest portals of entry to the bloodstream and oral inhalation (OI) has long been accepted as the preferred mode of administration of therapeutics to the respiratory tract. However, despite its advantages, the lungs have been largely underutilized to target ailments not only of systemic relevance but also several other grave conditions including lung cancer and tuberculosis. Polymeric nanocarriers (PNCs) have several advantages over other drug delivery vehicles including sustained release of moieties, ease of cellular internalization and improved targeting, and hence hold the promise to greatly augment the potential of OI therapies. …
Sacrificial Structure Preforms For Thin Part Machining,
2012
University of North Carolina at Charlotte
Sacrificial Structure Preforms For Thin Part Machining, Scott Smith, Robert Wilhelm, Brian Dutterer, Harish Cherukuri, Gaurav Goel
Department of Mechanical and Materials Engineering: Faculty Publications
Thin parts are often difficult to create by machining because they have insufficient static and dynamic stiffness. Accurate thin parts are difficult to achieve due to clamping forces, cutting forces, residual stresses, and chatter. Sacrificial structure preforms support the part during machining, but they are not part of the finished component. Preforms may be created in many ways, including forging, welding, gluing, casting, or additive processes. They can be used in many workpiece materials including metals, polymers, and ceramics. We describe a novel process that uses sacrificial structures to make machining insensitive to the thinness of finished parts.
Modified Statistical Dynamical Diffraction Theory : A Novel Metrological Analysis Method For Partially Relaxed And Defective C Doped Si And Sige Heterostructures,
2012
University at Albany, State University of New York
Modified Statistical Dynamical Diffraction Theory : A Novel Metrological Analysis Method For Partially Relaxed And Defective C Doped Si And Sige Heterostructures, Paul Kenneth Shreeman
Legacy Theses & Dissertations (2009 - 2024)
The statistical dynamical diffraction theory, which has been initially developed by late Kato remained in obscurity for many years due to intense and difficult mathematical treatment that proved to be quite challenging to implement and apply. With assistance of many authors in past (including Bushuev, Pavlov, Pungeov, and among the others), it became possible to implement this unique x-ray diffraction theory that combines the kinematical (ideally imperfect) and dynamical (the characteristically perfect diffraction) into a single system of equations controlled by two factors determined by long range order and correlation function within the structure. The first stage is completed by …
Generality In Nanotechnologies And Its Relationship To Economic Performance,
2012
University at Albany, State University of New York
Generality In Nanotechnologies And Its Relationship To Economic Performance, Fernando Gomez Baquero
Legacy Theses & Dissertations (2009 - 2024)
In the history if economic analysis there is perhaps no more important question than the one of how economic development is achieved. For more than a century, economists have explored the role of technology in economic growth but there is still much to be learned about the effect that technologies, in particular emerging ones, have on economic growth and productivity. The objective of this research is to understand the relationship between nanotechnologies and economic growth and productivity, using the theory of General Purpose Technology (GPT)-driven economic growth. To do so, the Generality Index (calculated from patent data) was used to …
Development Of Iii-V P-Mosfets With High-Kappa Gate Stack For Future Cmos Applications,
2012
University at Albany, State University of New York
Development Of Iii-V P-Mosfets With High-Kappa Gate Stack For Future Cmos Applications, Padmaja Nagaiah
Legacy Theses & Dissertations (2009 - 2024)
As the semiconductor industry approaches the limits of traditional silicon CMOS scaling, non-silicon materials and new device architectures are gradually being introduced to improve Si integrated circuit performance and continue transistor scaling. Recently, the replacement of SiO2 with a high-k material (HfO2) as gate dielectric has essentially removed one of the biggest advantages of Si as channel material. As a result, alternate high mobility materials are being considered to replace Si in the channel to achieve higher drive currents and switching speeds. III-V materials in particular have become of great interest as channel materials, owing to their superior electron transport …
Al/Cuxo/Cu Memristive Devices : Fabrication, Characterization, And Modeling,
2012
University at Albany, State University of New York
Al/Cuxo/Cu Memristive Devices : Fabrication, Characterization, And Modeling, Nathan Mcdonald
Legacy Theses & Dissertations (2009 - 2024)
Memristive devices have become very popular in recent years due to their potential to dramatically alter logic processing in CMOS circuitry. Memristive devices function as electrical potentiometers, allowing for such diverse applications as memory storage, multi-state logic, and reconfigurable logic gates.
Graphene-Based Post-Cmos Architecture,
2012
University at Albany, State University of New York
Graphene-Based Post-Cmos Architecture, Sansiri Tanachutiwat
Legacy Theses & Dissertations (2009 - 2024)
The semiconductor industry relies on CMOS technology which is nearing its scaling limitations. In order to continue the historical growth rate of the device density of digital logic chips, novel nanomaterials and nanodevices will need to be developed.
Virus Capsids As Nanoscale Delivery Vessels Of Photoactive Compounds For Site-Specific Photodynamic Therapy,
2012
University at Albany, State University of New York
Virus Capsids As Nanoscale Delivery Vessels Of Photoactive Compounds For Site-Specific Photodynamic Therapy, Brian Alexander Cohen
Legacy Theses & Dissertations (2009 - 2024)
The research presented in this work details the use of a viral capsid as an addressable delivery vessel of photoactive compounds for use in photodynamic therapy. Photodynamic therapy is a treatment that involves the interaction of light with a photosensitizing molecule to create singlet oxygen, a reactive oxygen species. Overproduction of singlet oxygen in cells can cause oxidative damage leading to cytotoxicity and eventually cell death. Challenges with the current generation of FDA-approved photosensitizers for photodynamic therapy primarily stem from their lack of tissue specificity. This work describes the packaging of photoactive cationic porphyrins inside the MS2 bacteriophage capsid, followed …
Micropatterned Electrospun Nanofibrous Substrates As Scaffolds For Engineered Salivary Glands,
2012
University at Albany, State University of New York
Micropatterned Electrospun Nanofibrous Substrates As Scaffolds For Engineered Salivary Glands, David Alexander Soscia
Legacy Theses & Dissertations (2009 - 2024)
The salivary gland is a complex organ exhibiting a branching, 3-dimensional structure made up of acinar (saliva-producing), and ductal (saliva transporting and modifying) epithelial cells. The high surface area of the gland allows it to efficiently provide the mouth with saliva, maintaining oral cleanliness and comfort. Salivary gland hypofunction, a significant clinical problem often caused by the autoimmune disease Sjögren's syndrome or head and neck radiation for cancer patients, affects millions of Americans and is characterized by a loss of function of salivary gland acinar cells. Chronic xerostomia, or dry mouth, arises as a result of salivary gland hypofunction and …
Measurement Of Electron Spin Transport In Graphene On 6h-Silicon Carbide(0001),
2012
University at Albany, State University of New York
Measurement Of Electron Spin Transport In Graphene On 6h-Silicon Carbide(0001), Joseph Abel
Legacy Theses & Dissertations (2009 - 2024)
The focus of this thesis is to demonstrate the potential of wafer scale graphene spintronics. Graphene is a single atomic layer of sp2-bonded carbon atoms that has high carrier mobilities, making it a desirable material for future nanoscale electronic devices. The vision of spintronics is to utilize the spin of the electron to produce novel high-speed low power consuming devices. Materials with long spin relaxation times and spin diffusion lengths are needed to realize these goals. Graphene is an ideal material as it meets these requirements and is amenable to planar device geometries.
Evaluation Of Chemical Mechanical Planarization (Cmp) For The Removal Of Surface Defects In Extreme Ultraviolet Lithography (Euvl) Mask Substrates,
2012
University at Albany, State University of New York
Evaluation Of Chemical Mechanical Planarization (Cmp) For The Removal Of Surface Defects In Extreme Ultraviolet Lithography (Euvl) Mask Substrates, Bradley Halligan Wood
Legacy Theses & Dissertations (2009 - 2024)
A modified CMP process was investigated and developed with the goal of removing surface defects (nanoscale depressions or `pits') from quartz mask blank substrates. Initially, quartz glass wafers were evaluated to observe surface roughness and defect introduction due to low down-force CMP processing. Following analysis of quartz glass wafers subjected to such processing it was determined that a CMP-based processing for pit removal of maskblank substrates was potentially viable. Consequently, a specially-designed mask carrier for investigating and developing CMP-based defect removal from EUV maskblank substrates was mounted on a Strasbaugh 6DS-SP CMP laboratory tool. A series of experiments was performed …
Development Of A Gas-Based Spectral Filter For Carbon Dioxide Laser Produced Plasma Extreme Ultraviolet Sources,
2012
University at Albany, State University of New York
Development Of A Gas-Based Spectral Filter For Carbon Dioxide Laser Produced Plasma Extreme Ultraviolet Sources, Chimaobi Mbanaso
Legacy Theses & Dissertations (2009 - 2024)
Currently, extreme ultraviolet (EUV) lithography is a promising next generation lithography technique for enabling the scaling of device features beyond 22 nm. Out-of-band radiation in EUV exposure tools remains one of the critical issues that must be addressed before the implementation of this lithography technique for high volume manufacturing. Laser produced plasmas which use a carbon dioxide (CO2) drive laser pulse are more likely to be used to generate EUV radiation because of their scalability to higher source power. The out-of-band spectrum at the intermediate focus of EUV sources that use a CO2 laser produced plasma is …
Development Of An Industrial Fabrication Process For Next Generation, Thinner And Larger Crystalline Silicon (C-Si) Wafer-Based Solar Cells,
2012
University at Albany, State University of New York
Development Of An Industrial Fabrication Process For Next Generation, Thinner And Larger Crystalline Silicon (C-Si) Wafer-Based Solar Cells, Anh Viet Nguyen
Legacy Theses & Dissertations (2009 - 2024)
The world's solar cell production has grown rapidly and steadily with an annual average of 30% over the last two decades. Single and micro-crystalline silicon solar cells have been the major reason for this production increase. In 2009, silicon-based solar cells comprised almost 90% of worldwide photovoltaic module shipments.
Experimental And Theoretical Analysis Of Strain Engineered Aluminium Nitride On Silicon For High Quality Aluminium(X)Indium(Y)Gallium(1-X-Y)Nitride Epitaxy,
2012
University at Albany, State University of New York
Experimental And Theoretical Analysis Of Strain Engineered Aluminium Nitride On Silicon For High Quality Aluminium(X)Indium(Y)Gallium(1-X-Y)Nitride Epitaxy, Mihir Hemant Tungare
Legacy Theses & Dissertations (2009 - 2024)
III-Nitrides on Si are of great technological importance due to the availability of large area, epi ready Si substrates and the ability to heterointegrate with mature silicon micro and nanoelectronics. The major roadblock with realizing this is the large difference in thermal expansion coefficients and lattice constants between the two material systems. A novel technique developed in our research lab shows the potential of simultaneous and substantial reduction in dislocation and crack density in GaN on Si (111). Research undertaken in the current doctoral dissertation, validates the superior GaN quality on Si obtained using our technique and determines the factors …
(In, Al) Co-Doped Zinc Oxide As A Novel Material System For Quantum-Well Multilayer Thermoelectrics,
2012
University at Albany, State University of New York
(In, Al) Co-Doped Zinc Oxide As A Novel Material System For Quantum-Well Multilayer Thermoelectrics, Sean C. Teehan
Legacy Theses & Dissertations (2009 - 2024)
Waste heat recovery from low efficiency industrial processes requires high performance thermoelectric materials to meet challenging requirements. The efficiency such a device is quantified by the dimensionless figure of merit ZT=S2σT/қ, where S is the Seebeck coefficient, σ is the electrical conductivity, T is the absolute temperature and қ is the thermal conductivity. For practical applications these devices are only cost-effective if the ZT is higher than 2.
The Influence Of Copper Substrate Orientation On Graphene Growth,
2012
University at Albany, State University of New York
The Influence Of Copper Substrate Orientation On Graphene Growth, Zachary Robert Robinson
Legacy Theses & Dissertations (2009 - 2024)
This dissertation is focused on determining the influence of the copper substrate on graphene grown by \ac{CVD}. Graphene, which can be grown in single atomic layers on copper substrates, has potential applications in future electronic devices. One of the key issues for the use of graphene grown by chemical vapor deposition for device applications is the influence of defects on the transport properties of the graphene. For instance, growth on metal foil substrates results in multi-domain graphene growth because the foil substrates themselves have a variety of different surface terminations. Therefore, they don't serve as a very good template for …
Molecular Vapor Deposition Of Organosilanes,
2012
University at Albany, State University of New York
Molecular Vapor Deposition Of Organosilanes, Sarah Kirsten Goulet
Legacy Theses & Dissertations (2009 - 2024)
Current strategies for low temperature bonding (<300 C) and 3D integration employ polymer interfaces (1-3 um) with low thermal conductivity which can result in poor heat transfer between bonded elements. The introduction of thinner interfaces to improve heat transfer is desirable; however, deposition of thin polymer films (<100 nm) for bonding applications can lead to reduced film uniformity and negatively affect bonding strength. Self-assembled monolayer (SAM) chemistries provide a potential solution and can yield nanometer control of the interfacial layer thickness without a significant effect on surface roughness. Siloxanes are one available option to realize these nanometer thin reactive layers. Due to their propensity to crosslink and form multilayers, careful control of the reaction conditions is required. Considering this, we have evaluated the molecular vapor deposition of siloxane precursors to generate molecular layers with reactive end-groups for potential use in bonding applications. Film stability, morphology, thickness, and composition were monitored after deposition using atomic force microscopy, ellipsometry and x-ray photoelectron spectroscopy.
A Novel Fabrication Technique For Three-Dimensional Nanostructures,
2012
University at Albany, State University of New York
A Novel Fabrication Technique For Three-Dimensional Nanostructures, Ravi Kiran Bonam
Legacy Theses & Dissertations (2009 - 2024)
Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.
The Development And Simulation Of Piezoelectric Surface Acoustic Wave Devices For Euv Mask Particle Removal,
2012
University at Albany, State University of New York
The Development And Simulation Of Piezoelectric Surface Acoustic Wave Devices For Euv Mask Particle Removal, Anthony Rae Davis
Legacy Theses & Dissertations (2009 - 2024)
Extreme Ultraviolet Lithography (EUVL) is a critical semiconductor fabrication process which uses 13.5 nanometer wavelength light reflected from a mask to print features on various wafers used for IC fabrication. An extensive amount of research is currently underway to make EUVL prevalent in efforts to allow for efficient sub-22 nm feature size fabrication. A number of challenges must be overcome before EUVL usage becomes feasible in terms of cost, wafer output, reliability, and throughput. One notable challenge in EUVL is the removal of mask contamination. EUV masks are required to be free of contamination to ensure precise feature printing. Particles …
