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Full-Text Articles in Plasma and Beam Physics
Hand-Held Flyback Driven Coaxial Dielectric Barrier Discharge: Development And Characterization, Victor J. Law, Vladimir Milosavljevic, Neil O’Connor, James F. Lalor, Steven Daniels
Hand-Held Flyback Driven Coaxial Dielectric Barrier Discharge: Development And Characterization, Victor J. Law, Vladimir Milosavljevic, Neil O’Connor, James F. Lalor, Steven Daniels
Articles
The development of a handheld single and triple chamber atmospheric pressure coaxial dielectric barrier discharge driven by Flyback circuitry for helium and argon discharges is described. The Flyback uses external metal-oxide-semiconductor field-effect transistor power switching technology and the transformer operates in the continuous current mode to convert a continuous dc power of 10–33 W to generate a 1.2–1.6 kV 3.5 μs pulse. An argon discharge breakdown voltage of ∼768 V is measured. With a 50 kHz, pulse repetition rate and an argon flow rate of 0.5–10 argon slm (slm denotes standard liters per minute), the electrical power density deposited in …
Real-Time Plasma Controlled Chemistry In A Two-Frequency, Confined Plasma Etcher, Vladimir Milosavljevic, Albert R. Ellingboe, Cezar Gaman, John V. Ringwood
Real-Time Plasma Controlled Chemistry In A Two-Frequency, Confined Plasma Etcher, Vladimir Milosavljevic, Albert R. Ellingboe, Cezar Gaman, John V. Ringwood
Articles
The physics issues of developing model-based control of plasma etching are presented. A novel methodology for incorporating real-time model-based control of plasma processing systems is developed. The methodology is developed for control of two dependent variables (ion flux and chemical densities) by two independent controls (27 MHz power and O2flow). A phenomenological physics model of the nonlinear coupling between the independent controls and the dependent variables of the plasma is presented. By using a design of experiment, the functional dependencies of the response surface are determined. In conjunction with the physical model, the dependencies are used to deconvolve the sensor …
Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels
Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels
Articles
This paper presents a method for precise measurement of atomic and molecular nitrogen in an oxygen-nitrogen dc plasma. This is achieved by monitoring the intensities of the atomic nitrogen spectral line at 821.6 nm and the molecular nitrogen bandhead at 337.1 nm, relative to the atomic oxygen spectral line at 844.7 nm. Oxygen is one of the most frequently used gases for surface chemical treatment, including deposition and etching, therefore the ability to measure and control the process and chemical composition of the process is essential. To validate this oxygen actimometry method for N2-xO2 (where x varies from 0 to …