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Chemical and Materials Engineering Faculty Publications

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Articles 211 - 215 of 215

Full-Text Articles in Materials Science and Engineering

Control Of Plasma Flux Composition Incident On Tin Films During Reactive Magnetron Sputtering And The Effect On Film Microstructure, Christopher Muratore, Scott G. Walton, Darrin Leonhardt, Richard F. Fernsler Jan 2006

Control Of Plasma Flux Composition Incident On Tin Films During Reactive Magnetron Sputtering And The Effect On Film Microstructure, Christopher Muratore, Scott G. Walton, Darrin Leonhardt, Richard F. Fernsler

Chemical and Materials Engineering Faculty Publications

A hybrid plasma enhanced physical vapor deposition (PEPVD) system consisting of an unbalanced dc magnetron and a pulsed electron beam-produced plasma was used to deposit reactively sputtered titanium nitride thin films. The system allowed for control of the magnitudes of the ion and neutral flux, in addition to the type of nitrogen ions (atomic or molecular) that comprised the flux. For all deposition experiments, the magnitude of the ion flux incident on the substrate was held constant, but the composition of the total flux was varied. X-ray diffraction and atomic force microscopy showed that crystallographic texture and surface morphology of …


Etching With Electron Beam Generated Plasmas, D. Leonhardt, Scott G. Walton, Christopher Muratore, Richard F. Fernsler, R. A. Meger Jan 2004

Etching With Electron Beam Generated Plasmas, D. Leonhardt, Scott G. Walton, Christopher Muratore, Richard F. Fernsler, R. A. Meger

Chemical and Materials Engineering Faculty Publications

A modulated electron beam generated plasma has been used to dry etch standard photoresist materials and silicon. Oxygen–argon mixtures were used to etch organic resist material and sulfur hexafluoride mixed with argon or oxygen was used for the silicon etching. Etch rates and anisotropy were determined with respect to gas compositions, incident ion energy (from an applied rf bias) and plasma duty factor. For 1818 negative resist and i-line resists the removal rate increased nearly linearly with ion energy (up to 220 nm/min at 100 eV), with reasonable anisotropic pattern transfer above 50 eV. Little change in etch rate was …


Effect Of Plasma Flux Composition On The Nitriding Rate Of Stainless Steel, Christopher Muratore, Scott G. Walton, D. Leonhardt, Richard F. Fernsler, David D. Blackwell, R. A. Meger Jan 2004

Effect Of Plasma Flux Composition On The Nitriding Rate Of Stainless Steel, Christopher Muratore, Scott G. Walton, D. Leonhardt, Richard F. Fernsler, David D. Blackwell, R. A. Meger

Chemical and Materials Engineering Faculty Publications

The total ion flux and nitriding rate for stainless steel specimens exposed to a modulated electron beam generated argon-nitrogen plasma were measured as a function of distance from the electron beam axis. The total ion flux decreased linearly with distance, but the nitriding rate increased under certain conditions, contrary to other ion flux/nitriding rate comparisons published in the literature. Variation in ion flux composition with distance was explored with a mass spectrometer and energy analyzer as a possible explanation for the anomalous nitriding rate response to ion flux magnitude. A transition in ion flux composition from mostly N2 1 to …


Development Of A Curved Layer Lom Process For Monolithic Ceramics And Ceramic Matrix Composites, Donald A. Klosterman, Richard P. Chartoff, Nora R. Osborne, George A. Graves, Allan Lightman, Gyoowan Han, Akos Bezewredi, Stan Rodrigues, Sung Pak, Gary Kalmanovich, Leon Dodin, Song Tu Jun 1999

Development Of A Curved Layer Lom Process For Monolithic Ceramics And Ceramic Matrix Composites, Donald A. Klosterman, Richard P. Chartoff, Nora R. Osborne, George A. Graves, Allan Lightman, Gyoowan Han, Akos Bezewredi, Stan Rodrigues, Sung Pak, Gary Kalmanovich, Leon Dodin, Song Tu

Chemical and Materials Engineering Faculty Publications

A novel rapid prototyping technology incorporating a curved layer building style was developed. The new process, based on Laminated Object Manufacturing (LOM), was designed for efficient fabrication of curved layer structures made from ceramics and fiber reinforced composites. A new LOM machine was created, referred to as Curved Layer LOM. This new machine uses ceramic tapes and fiber prepregs as feedstocks and fabricates curved structures on a curved-layer by curved-layer basis. The output of the process is a three dimensional "green" ceramic that is capable of being processed to a seamless, fully dense ceramic using traditional techniques. A detailed description …


Removal Of Chlorine From Chlorine-Nitrogen Mixture In A Film Of Liquid Water, Sarwan S. Sandhu Apr 1991

Removal Of Chlorine From Chlorine-Nitrogen Mixture In A Film Of Liquid Water, Sarwan S. Sandhu

Chemical and Materials Engineering Faculty Publications

In industry there are many examples of absorption of a gas with or without chemical reaction in the liquid phase. In physical absorption, a particular gaseous component is removed from a gas mixture due to its larger solubility in the liquid phase solvent. The removal of butane and pentane from a refinery gas mixture by a heavy oil in the liquid phase is an example of physical absorption. In absorption with chemical reaction, the gaseous component to be removed transfers across the gas-liquid interface due to a difference in the bulk chemical potentials or concentrations in the two phases. The …