Nanotechnology Fabrication Commons^™

Subwavelength Engineering Of Silicon Photonic Waveguides, Farhan Bin Tarik

All Dissertations

The dissertation demonstrates subwavelength engineering of silicon photonic waveguides in the form of two different structures or avenues: (i) a novel ultra-low mode area v-groove waveguide to enhance light-matter interaction; and (ii) a nanoscale sidewall crystalline grating performed as physical unclonable function to achieve hardware and information security. With the advancement of modern technology and modern supply chain throughout the globe, silicon photonics is set to lead the global semiconductor foundries, thanks to its abundance in nature and a mature and well-established industry. Since, the silicon waveguide is the heart of silicon photonics, it can be considered as the core …

Synthetic Aperture Optical Imaging Interferometric Microscopy With Improved Image Quality, Preyom K. Dey

Electrical and Computer Engineering ETDs

The resolution limit of optical microscopy can be extended by using Imaging Interferometric Microscopy (IIM), which uses a low numerical aperture (NA) objective lens to achieve resolution equivalent to that of a high-NA objective lens with multiple sub-images. Along with the resolution enhancement challenge, IIM often suffers from poor image quality. In this dissertation, several image quality improvement methods are proposed and verified with simulation and experimental results. Next, techniques to extend the resolution limit of IIM to ≤ 100nm using a low-NA objective lens are demonstrated. An experimental technique of using a grating coupler on …

Fabricating Nanophotonic Devices Using Nanofabrication Techniques, Scott Cummings

Student Scholar Symposium Abstracts and Posters

Nanofabrication processes are widely used to make the integrated circuits and computer chips that are ubiquitous in today’s technology. These fabrication processes can also be applied to the creation of nanophotonic devices. The ways in which we apply these fabrication techniques in the field of photonics is often constrained by the technologies used for electronics manufacturing which presents an interesting engineering challenge. These limitations include availability and cost of certain fabrication equipment and techniques required to create state-of-the-art nanophotonic devices. Through work with the University of California Irvine nano-fabrication cleanroom, we designed and fabricated various integrated photonic components including grating …

Nanofabrication Of Metallic Nanostructures And Integration With Light Detection Devices, Liang Huang

Graduate Theses and Dissertations

Metallic nanostructures have been investigated with various applications especially for integration with light detection devices. The incident light can be manipulated by those nanostructures to enhance light absorption therefor improve device performance. However, previous studies focused on optical design. The electrical properties of these integrated light detection devices have not been fully considered. The photon generated carriers transport and collection are critical for light detection devices as well. An optimized device platform considering from both the optical and electrical aspects to fully utilize these nanostructures is highly desired for future light detection devices.

This dissertation targeted on three objectives, beginning …

Metal-Assisted Etching Of Silicon Molds For Electroforming, Ralu Divan, Dan Rosenthal '14, Karim Ogando, Leonidas E. Ocola, Daniel Rosenmann, Nicolaie Moldovan

Student Publications & Research

Ordered arrays of high-aspect-ratio micro/nanostructures in semiconductors stirred a huge scientific interest due to their unique one-dimensional physical morphology and the associated electrical, mechanical, chemical, optoelectronic, and thermal properties. Metal-assisted chemical etching enables fabrication of such high aspect ratio Si nanostructures with controlled diameter, shape, length, and packing density, but suffers from structure deformation and shape inconsistency due to uncontrolled migration of noble metal structures during etching. Hereby the authors prove that a Ti adhesion layer helps in stabilizing gold structures, preventing their migration on the wafer surface while not impeding the etching. Based on this finding, the authors demonstrate …