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Articles 31 - 33 of 33

Full-Text Articles in Nanotechnology Fabrication

Feedback Control For Electron Beam Lithography, Yugu Yang Jan 2012

Feedback Control For Electron Beam Lithography, Yugu Yang

Theses and Dissertations--Electrical and Computer Engineering

Scanning-electron-beam lithography (SEBL) is the primary technology to generate arbitrary features at the nano-scale. However, pattern placement accuracy still remains poor compared to its resolution due to the open-loop nature of SEBL systems. Vibration, stray electromagnetic fields, deflection distortion and hysteresis, substrate charging, and other factors prevent the electron-beam from reaching its target position and one has no way to determine the actual beam position during patterning with conventional systems. To improve the pattern placement accuracy, spatial-phase-locked electron-beam lithography (SPLEBL) provides feedback control of electron-beam position by monitoring the secondary electron signal from electron-transparent fiducial grids on the substrate. While …


Fabrication And Study Of Molecular Devices And Photovoltaic Devices By Metal/Dielectric/Metal Structures, Bing Hu Jan 2011

Fabrication And Study Of Molecular Devices And Photovoltaic Devices By Metal/Dielectric/Metal Structures, Bing Hu

University of Kentucky Doctoral Dissertations

A new class of electrodes with nanometer-scale contact spacing can be produced at the edge of patterned metal/insulator/metal this film structures. A key challenge is to produce insulator layers with low leakage current and have pristine metal contacts for controlled molecular contacts. Atomic layer deposition of high quality Al2O3 thin films onto Au electrodes was enabled by surface modification with a self-assembled monolayer of -OH groups that react with a monolayer of trimethylaluminum gas source. Ar ion milling was then used to expose the edge of the Au/dielectric/Au structure for molecular electrode contacts. The junctions are characterized …


Fabrication Of Nanostructures For Improved Performance Of Electrochemical Sensors And For Reference Compensation In Localized Surface Plasmon Resonance Sensors, Prashanthi Para Jan 2009

Fabrication Of Nanostructures For Improved Performance Of Electrochemical Sensors And For Reference Compensation In Localized Surface Plasmon Resonance Sensors, Prashanthi Para

University of Kentucky Master's Theses

L‐glutamate is associated with several neurological disorders; thus, monitoring fast dynamics of L‐glutamate is of great importance in the field of neuroscience. Electrode miniaturization demanded by many applications leads to reduced surface area and decreased amounts of immobilized enzymes on coated electrodes. As a result, lower signal‐to‐noise ratios are observed for oxidase‐enzyme based sensors. To increase the signal‐to‐noise ratio we have developed a process to fabricate micro‐ and nano‐ structures on the microelectrode surface.

Localized surface‐plasmon resonances (SPR) has been extensively used to design label‐free biosensors that can monitor receptor‐ligand interactions. A major challenge with localized SPR sensors is that …