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Articles 23701 - 23730 of 27383

Full-Text Articles in Engineering

Preparation And Characterization Of Tin-Nickel Alloy Electromagnetic Shielding Fabric, Ke-Jing Chu, Wei Wang, Bin Sun, Mei-Fang Zhu Feb 2009

Preparation And Characterization Of Tin-Nickel Alloy Electromagnetic Shielding Fabric, Ke-Jing Chu, Wei Wang, Bin Sun, Mei-Fang Zhu

Journal of Electrochemistry

A soft electromagnetic shielding fabric was successfully prepared by electroplating tin-nickel alloy on the Cu-plated PET fabric in potassium pyrophosphate system. Results show that the different tin content and different colour can be obtained by changing the ratio of metals in bath. Better corrosion resistance and anti-tarnishing were achieved with the fabric consisting of 68.96% Sn. The tin-nickel alloy surface for the electromagnetic shielding fabric had excellent conductivity, softness, permeability and soft luster, non-sensitized to the human body. Thereby it has broad prospect in EMI field and shielding clothing.

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Electrosynthesis Of 2,2-Dimethylolpropionic Acid, Hong-Yan Sun, Zhen-Hai Liang Feb 2009

Electrosynthesis Of 2,2-Dimethylolpropionic Acid, Hong-Yan Sun, Zhen-Hai Liang

Journal of Electrochemistry

The Ti/SnO2+Sb2O4/PbO2 electrode was prepared.The structure phase and valent state were characterized by means of XRD and XPS.The 2,2-dimethylolpropionic acid was synthesized on the Ti/SnO2+Sb2O4/PbO2 anode by direct electro-oxidation of 2,2-dimethylolpropionaldehyde.The product and crude material were analyzed by HPLC,the effects of the concentration of 2,2-dimethylolpropionaldehyde,pH,potential and reaction temperature were studied.The results showed that the optimum conditions were anode potential 1.8 V,pH=1,reaction temperature 15 ℃ and 2,2-dimethylolpropionaldehyde concentration 0.10mol/L.Under the optimum conditions,the selectivity of 36%,the current efficiency of 28% and the conversion of 58% were reached.The reported …

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The Electrochemical Behavior And Determination Of Carbendazim On Iron Montmorillonite Modified Electrode, Xiao-Li Jiang, Rong Li, Xiao-Ying He, Jiang Li, Ying Li Feb 2009

The Electrochemical Behavior And Determination Of Carbendazim On Iron Montmorillonite Modified Electrode, Xiao-Li Jiang, Rong Li, Xiao-Ying He, Jiang Li, Ying Li

Journal of Electrochemistry

The FeCl3 modified clay electrode was made.The electrochemical behavior of carbendazim(BCM) on the modified electrode was studied by cyclic voltammetry.The impacts of pH,scan rate and dosages of modifier were discussed and the important kinetic parameters of the electrochemical process were determined.The results indicated that the process was controlled by diffusion.The effective area of FeMM-CMC/GCE(A)=0.027 cm2,the transfer electron numbers(n)=2 and the diffusion coefficient(D)=5.115×10-6cm2/s.Under the optimized conditions,a good linearity was found between the first order derivative of peak current and concentration of BCM in the range of 2.00×10-5～8.00×10-4mol/L,with i′p=-8.045×10-7-0.0237c,correlation …

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Voltage Delay On Li/Socl2 And Bcx Cells During Discharge, Shu-Tao Liu, Yi-Ping Wu, Hong-Hua Ge, Guo-Ding Zhou Feb 2009

Voltage Delay On Li/Socl2 And Bcx Cells During Discharge, Shu-Tao Liu, Yi-Ping Wu, Hong-Hua Ge, Guo-Ding Zhou

Journal of Electrochemistry

The impedance change of both lithium and carbon electrodes during the process of discharge was studied by AC impedance spectroscopy.It shows that the impedance of lithium electrode at initial stage was reduced by 80%～90% and kept nearly unchanged after wards;the carbon electrode impedance initially did not change much but quickly increased just before the end of discharge.The improvement of voltage delay might be related with the higher open-circuit voltage of BCX cell.It is suggested that the voltage delay problem may be solved by the application of supercapacitor.

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Synthesis,Characteristics And Electrochemical Performance Of Nano-Sized Snco/Graphite Composites As Anode For Lithium Ion Batteries, Jin-Shu Cai, Ling Huang, Fu-Sheng Ke, Shi-Gang Sun Feb 2009

Synthesis,Characteristics And Electrochemical Performance Of Nano-Sized Snco/Graphite Composites As Anode For Lithium Ion Batteries, Jin-Shu Cai, Ling Huang, Fu-Sheng Ke, Shi-Gang Sun

Journal of Electrochemistry

The nano-structural Sn-Co/graphite composites were prepared by chemical reduction of the alloy electroless deposition solution in graphite suspensions, and the composites were annealed at 500 ℃. The phase structure and surface morphology of the composites were measured by XRD, SEM and Raman. The results indicate that there were high dispersions and high loadings of Sn-Co nanoparticles on graphite by thermal treatment. Electrochemical lithium storage performance was studied preliminarily on the obtained samples. The graphite modified with the Sn-Co nanoparticles possessed a higher electrochemical reversible capacity than that of graphite during the charge and discharge process. The appetency between the Sn-Co …

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High Utilization Aupt Nanoparticles Supported On Mwcnts For Methanol Electro-Oxidation In Alkaline Medium, Xun Guo, Dao-Jun Guo, Xin-Ping Qiu, Li-Quan Chen, Wen-Tao Zhu Feb 2009

High Utilization Aupt Nanoparticles Supported On Mwcnts For Methanol Electro-Oxidation In Alkaline Medium, Xun Guo, Dao-Jun Guo, Xin-Ping Qiu, Li-Quan Chen, Wen-Tao Zhu

Journal of Electrochemistry

We synthesized gold-platinum electrocatalysts supported on multi-walled carbon nanotubes(MWCNTs) with high utilization by a simple one-step method.A high Pt loading series of bimetallic AuPt/MWCNTs catalysts were prepared by the improved ethylene glycol reduction method,and then were compared in terms of the electrocatalytic activity for methanol electro-oxidation using cyclic voltammetry(CV) and chronoamperometry in alkaline solutions.The structure of AuPt/MWCNTs was characterized by the transmission electron microscopy(TEM),X-ray diffraction(XRD) and energy-dispersive X-ray spectroscopy(EDS).The results showed that the AuPt/MWCNTs catalysts had high Pt utilization,uniform AuPt nanoparticles size and good electrocatalytic activity for methanol electro-oxidation.The effect of Au/Pt mass ratio on electrocatalytic activity was also investigated.The …

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Development Of A Planarization Process For The Fabrication Of Iii-V On Silicon Esaki Diodes, Michael J. Barth Jan 2009

Development Of A Planarization Process For The Fabrication Of Iii-V On Silicon Esaki Diodes, Michael J. Barth

Journal of the Microelectronic Engineering Conference

Esaki diodes are tunnel diodes with a very abrupt and degenerately doped PN junction. This abrupt junction causes the conduction bands to overlap, thus allowing for tunneling when a small bias is applied. 111-V on silicon Esaki tunnel diodes offer higher performance at lower power supplies compared to silicon. A vertical mesa etch is used to isolate the Esaki devices from each other. The etch results in a significant undercut below the gold contact which can cause issues with electrical testing. When probed the gold contact can short to the substrate. The solution to this is the addition of a …

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A Simulator For Euv Lithography Mirrors, Thiago S. Jota Jan 2009

A Simulator For Euv Lithography Mirrors, Thiago S. Jota

Journal of the Microelectronic Engineering Conference

The design of a simulator for EUV lithography mirrors is presented. A method of computing the expected value of reflectance and transmittance in stratified absorbing media with rough interfaces, based on Jay Eastman’s matrix formalism for scattered fields, was developed. In addition, a proof of principle experiment confirmed process feasibility for EUV mirror research at RIT.

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Fabrication And Characterization Of Solar Cells On P-Type Si And P/P+Epitaxial Si, Nathaniel Kane Jan 2009

Fabrication And Characterization Of Solar Cells On P-Type Si And P/P+Epitaxial Si, Nathaniel Kane

Journal of the Microelectronic Engineering Conference

Solar cells were fabricated at the Semiconductor and Microsystems Fabrication Laboratory at Rochester Institute of Technology on two different substrates. Standard polished p-type Si and a substrate consisting of a 15 μm p-type epitaxial Si built on a p+ substrate Si wafer. In addition, on the epitaxial Si both diffusion and ion implantation were used for doping. Using both epitaxial Si and ion implantation created solar cells that outperformed the diffusion and p-type Si solar cells.

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Band-Pass Saw Filters On 128 Rotated Y-Cut Black Lithium Niobate, Sean M. Dunphy Jan 2009

Band-Pass Saw Filters On 128 Rotated Y-Cut Black Lithium Niobate, Sean M. Dunphy

Journal of the Microelectronic Engineering Conference

128° rotated Y-cut Black Lithium Niobate is used as a substrate material for the creation of simple one pass SAW bandpass filters. Center frequencies between 100 and 300 MHz were designed with varying aperture widths and designed bandwidths. The S21 measurements were made with Agilent Technologies E5071C, two port network analyzer, and were compared to theory. Without considering the effects of the asymmetric coplanar waveguides (ACPW) used to connect the ground-signal-ground probes to the device under test (DUT) the average distance between measured and theoretical data is 0.523dB, near the center frequency.

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Mask-Less Crystalline Silicon Solar Cell (May 2009), C K. Chan, R E. Pearson Jan 2009

Mask-Less Crystalline Silicon Solar Cell (May 2009), C K. Chan, R E. Pearson

Journal of the Microelectronic Engineering Conference

A mask-less crystalline silicon solar cell was made by using a surface texturing technique coupled with an oblique aluminum evaporation. To achieve this, trenches with a steep sidewall are mechanically grooved into the bulk silicon using the KS 775 Wafer Saw. More importantly, metal evaporation with the CVC evaporator at angles near parallel to the wafer surface allows deposition to occur along the side of the trenches creating the self-aligning front metal contacts. Of the four solar cells that made it through the processing, only one solar cell showed diode like 1-V characteristics. The dark conditions shows a diode 1-V …

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A New 6" Metal Gate Pmos Process, Jessica Marks Jan 2009

A New 6" Metal Gate Pmos Process, Jessica Marks

Journal of the Microelectronic Engineering Conference

This paper presents the development, fabrication, and testing of a new 6” Metal Gate PMOS process. The new 6-inch Metal Gate PMOS process is an upgrade from the 4-inch Metal Gate PMOS process, which is the process currently used at RIT for the IC Technology course as ivell as the Short Course. The upgrades include the use of 6-inch wafers from 4-inch wafers, four levels per mask lithography instead of one level per mask lithography, ion implant instead of spin on dopant, and the number of control wafers was reduced from five wafers to three wafers. Development and fabrication of …

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Photodiode Development For Fluorescence Spectroscopy Applications, Jeremy Goodman Jan 2009

Photodiode Development For Fluorescence Spectroscopy Applications, Jeremy Goodman

Journal of the Microelectronic Engineering Conference

Two photodiode architectures were designed, built, and tested for comparison for implementation into a fluorescence spectroscopy, or fluorometric, system. All devices were fabricated on 4-inch, N-type silicon substrates. The photodiodes presented were tested for responsivity and response time, two main factors judging effective incorporation in fluorometric applications. The planar photodiode excels in responsivity due to the device’s large active-area; however, high junction capacitance greatly hinders the response time. The lateral photodiode had much lower junction capacitance than the planar, but exhibited lesser responsivity due to the decreased active area size. The lateral photodiode was chosen as a candidate for timeresolved …

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Low Temperature Junction Formation In Silicon, Andrew Mccable Jan 2009

Low Temperature Junction Formation In Silicon, Andrew Mccable

Journal of the Microelectronic Engineering Conference

The goal of this project was to examine the low temperature formation of silicon P-N junctions on SOl substrates. P+N and N+P diodes were fabricated with several different dopants at various implant doses. The effects of the silicon thickness were also examined. Existing theories of low temperature phosphorous solid-phase epitaxy (SPE) were verified through this study.

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Process Design & Development Of Contact Cut Double Patterning, William A. Namestnik Jan 2009

Process Design & Development Of Contact Cut Double Patterning, William A. Namestnik

Journal of the Microelectronic Engineering Conference

Optical double patterning allows for increased quality control over varying film stacks as well as allowing photolithography equipment to image smaller dense features. This is done by splitting dense patterns into two separate masks. A contact cut layer double patterning process was developed, and proved to be successful down to contact density of 4 μm CD by 4 μm density (4x4 μm CD x Density). Conventional dark field double patterning processes use two separate substrate etch steps (one etch step after each pass of lithography). This project developed a dark field double patterning process which incorporated light …

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Nickel Nanodots For Memory Devices, Anthony J. Pacifico Jan 2009

Nickel Nanodots For Memory Devices, Anthony J. Pacifico

Journal of the Microelectronic Engineering Conference

The formation of Nickel Nanodots (Ni-ND) were studied for the purpose of their potential use in memory devices. Ni-NDs were formed on SiO2 and integrated into capacitors. These structures were then tested to demonstrate charge storage characteristics.

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Characterization Of Microelectromechanical Systems (Mems) Flow Channel (May 2009), C Padilla Jan 2009

Characterization Of Microelectromechanical Systems (Mems) Flow Channel (May 2009), C Padilla

Journal of the Microelectronic Engineering Conference

MicroElectroMechanical System (MEMS) devices are integrations between mechanical engineering, electrical engineering, and microelectronic engineering. There are many different applications for MEMS such as micro mirrors, pumps, nozzle, and a plethora of sensor types. The Microelectronic engineering department at Rochester Institute of Technology offers a class in MEMS. Within this class, many MEMS applications are further studied and created, one being a gas flow sensor. In 2008, George Manos created a packaging fabrication process for the RIT flow sensor for further future analysis. Along with the use of the package, Dr. Lynn Fuller and Jessica Marks created the tested sensors. Through …

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Surface Imaging Through Silylation, Chelsea R. Plourde Jan 2009

Surface Imaging Through Silylation, Chelsea R. Plourde

Journal of the Microelectronic Engineering Conference

Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specified areas. Photoresist containing silicon creates a hard-mask which is resistant to oxygen plasma. This allows for the development process to occur strictly in dry etch systems. Surface imaging is a desirable technique because it removes the need to expose through the photoresist stack. Traditional lithography techniques require a high dose of ultra-violet (UV) light in order to penetrate to the bottom of a photoresist stack. It is critical, for quality imaging, that the photoresist not be over or under exposed. This creates a process window …

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Front Contact Grid Design For Terrestrial Iii-V Concentrator Solar Cells, Stephen J. Polly, Michael Jackson, Seth Hubbard Jan 2009

Front Contact Grid Design For Terrestrial Iii-V Concentrator Solar Cells, Stephen J. Polly, Michael Jackson, Seth Hubbard

Journal of the Microelectronic Engineering Conference

Photovoltaic devices can exhibit an increase in conversion efficiency as increasing power density is concentrated onto them. Design of the front contact grid is a major processing step that can govern the concentration at which the efficiency is at a peak. A series of equations provided by M. Green was used to design GaAs solar cells for concentrations of 1, 25, 50, 100, and 200 suns. The cells were processed and tested under a 1-sun calibrated AM1.5G spectrum, as well as a Large Area Pulsed Solar Simulator to measure device parameters under concentrated light. All devices—except the ones designed for …

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Etching For Dual Damascene Fabrication, Samuel Rodens Jan 2009

Etching For Dual Damascene Fabrication, Samuel Rodens

Journal of the Microelectronic Engineering Conference

Dual damascene fabrication requires precise dry-etching. Two different methods were investigated: via-first and trench-first. It was found under conditions tested with that micromasking occurred, which was caused by damage to the resist. This caused the dielectric regions to be etched in the unmasked regions, as well as causing significant roughness. However, both etch techniques were found to have the capability of being used in a university dual damascene process.

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4-Bit Microprocessor: Design, Simulation, Fabrication, And Testing, A J. Ryan, G O. Phillips, R E. Pearson, L F. Fuller Jan 2009

4-Bit Microprocessor: Design, Simulation, Fabrication, And Testing, A J. Ryan, G O. Phillips, R E. Pearson, L F. Fuller

Journal of the Microelectronic Engineering Conference

The work presented demonstrates the unique ability of Rochester Institute of Technology’s Microelectronic Engineering department to design, simulate, fabricate, and test complex digital integrated circuits. Utilizing the resources available, the author would be the first undergraduate at RIT to successfully drive the creation of a microprocessor from design through fabrication to test. The microprocessor created is the most complex digital circuit ever fabricated at RIT. Fabrication was completed on three lots using the well-established RIT sub μm CMOS Process. Functional CMOS transistors were demonstrated at the Metal 1 level, but complex digital integrated circuits were not realized beyond that.

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The Role Of Fluorine In Growth Rate Enhancement And Charge Supperssion On A Low Temperature Thermally Sio2 Interface Layer, Brian R. Silkey Jan 2009

The Role Of Fluorine In Growth Rate Enhancement And Charge Supperssion On A Low Temperature Thermally Sio2 Interface Layer, Brian R. Silkey

Journal of the Microelectronic Engineering Conference

Integration of CMOS devices on to glass substrates has many process constraints. One of these is the melting point of the substrate, which is much lower than silicon. Normally a thermal oxide is desired for use as the gate dielectric, but at the lower temperature constraints due to the substrate it is not possible. One potential solution to this is they use of fluorine as an oxidation enhancement source is the ambient.

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Metastable States And Leakage In Pn Junction Diodes, P Whiting, K Hirschman Jan 2009

Metastable States And Leakage In Pn Junction Diodes, P Whiting, K Hirschman

Journal of the Microelectronic Engineering Conference

The low-temperature annealing kinetics of ion implanted silicon is a critical factor worthy of consideration when thin film crystalline silicon is processed on a low temperature substrate. Deep Level Transient Spectroscopy, Thermally Stimulated Current and Current-Voltage characteristics suggest that competition between Solid Phase Epitaxial Regrowth and dislocation loop formation is a critical factor in silicon implanted with P31 ions and annealed at temperatures ranging from 525°C to 65O°C. Solid Phase Epitaxy dominates the kinetics of fully amorphized samples annealed at 525°C, where shallow-level trap states dominate the reversed-bias leakage current of diodes. At low implanted doses (where the substrate is …

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A Walking Silicon Robot, David W. Grund Jr, Lynn F. Fuller Jan 2009

A Walking Silicon Robot, David W. Grund Jr, Lynn F. Fuller

Journal of the Microelectronic Engineering Conference

The goal of this project was to design and implement a MEMS process for the creation of a walking silicon robot using the equipment available at RIT. An attempt was carried out to create a mobility system based on the thermal expansion of polyimide joints as demonstrated by Ebefors. The designed process was successfully implemented through the oxidation of the joint surfaces. Issues with the Al resistor and polyimide lithography prevented the successful completion of the rest of the process.

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Design & Fabrication Of An 8 Bit Adc, Garret Phillips Jan 2009

Design & Fabrication Of An 8 Bit Adc, Garret Phillips

Journal of the Microelectronic Engineering Conference

MEMs devices at RIT utilize off chip circuitry to be properly utilized. This paper purposes an eight bit successive approximation analog to digital converter (ADC) to add to said devices as to simplify their operation. The ADC was designed and simulated using Mentor Graphics and Winspice software for the digital and analog components respectively. Lay out was then performed for the device as well as a simplified three bit version and various test circuits. Fabrication was done in the RIT SFML using RIT’s Sub-μ CMOS process, which uses a 2μm gate length. Functional transistors and simple devices …

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A Computational Model Of Breast Ducts, Jordan Greenlee Jan 2009

A Computational Model Of Breast Ducts, Jordan Greenlee

Inquiry: The University of Arkansas Undergraduate Research Journal

Ductal Carcinoma represents almost 75% of breast cancer. In this specific type of cancer. malignant cells in the breast ducts invade the surrounding healthy tissue. Almost all researchers who are investigating microwave modality in the area of breast cancer detection employ oversimplified models of the internal structure of the breast. Use of engineered or biologically inaccurate models can render inaccurate results. Therefore. a mathematical biological model was implemented in this work aiming to bridge the gap between physiologists and engineers. The result show that the proposed breast duct model has the capability of modeling the breast ducts of different kinds …

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Defining A Forensic Audit, G. S. Smith, D. L. Crumbley Jan 2009

Defining A Forensic Audit, G. S. Smith, D. L. Crumbley

Journal of Digital Forensics, Security and Law

Disclosures about new financial frauds and scandals are continually appearing in the press. As a consequence, the accounting profession's traditional methods of monitoring corporate financial activities are under intense scrutiny. At the same time, there is recognition that principles-based GAAP from the International Accounting Standards Board will become the recognized standard in the U.S. The authors argue that these two factors will change the practices used to fight corporate malfeasance as investigators adapt the techniques of accounting into a forensic audit engagement model.

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Visualisation Of Honeypot Data Using Graphviz And Afterglow, Craig Valli Jan 2009

Visualisation Of Honeypot Data Using Graphviz And Afterglow, Craig Valli

Journal of Digital Forensics, Security and Law

This research in progress paper explores the use of Graphviz and Afterglow for the analysis of data emanating from a honeypot system. Honeypot systems gather a wide range of data that is often difficult to readily search for patterns and trends using conventional log file analysis techniques. The data from the honeypots has been statically extracted and processed through Afterglow scripts to produce inputs suitable for use by the DOT graph based tools contained within Graphviz. This paper explores some of the benefits and drawbacks of currently using this type of approach.

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Insecurity By Obscurity: A Review Of Soho Router Literature From A Network Security Perspective, Patryk Szewczyk, Craig Valli Jan 2009

Insecurity By Obscurity: A Review Of Soho Router Literature From A Network Security Perspective, Patryk Szewczyk, Craig Valli

Journal of Digital Forensics, Security and Law

Because of prevalent threats to SoHo based ADSL Routers, many more devices are compromised. Whilst an end-user may be at fault for not applying the appropriate security mechanisms to counter these threats, vendors should equally share the blame. This paper reveals that the lack of security related content and poor overall design could impact on end-users’ interpretation and willingness to implement security controls on their ADSL router. It argues that whilst the number of threats circulating the Internet is increasing, vendors are not improving their product literature.

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The Journal Of Undergraduate Research: Volume 07 Jan 2009

The Journal Of Undergraduate Research: Volume 07

The Journal of Undergraduate Research

This is the complete issue of the South Dakota State University Journal of Undergraduate Research, Volume 7.

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