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Full-Text Articles in Physics
Selective Growth Of Epitaxial Sr2Iro4 By Controlling Plume Dimensions In Pulsed Laser Deposition, Sung S. Ambrose Seo, J. Nichols, J. Hwang, Jsaminka Terzic, John H. Gruenewald, Maryam Souri, Justin K. Thompson, John G. Connell, Gang Cao
Selective Growth Of Epitaxial Sr2Iro4 By Controlling Plume Dimensions In Pulsed Laser Deposition, Sung S. Ambrose Seo, J. Nichols, J. Hwang, Jsaminka Terzic, John H. Gruenewald, Maryam Souri, Justin K. Thompson, John G. Connell, Gang Cao
Physics and Astronomy Faculty Publications
We report that epitaxial Sr2IrO4 thin-films can be selectively grown using pulsed laser deposition (PLD). Due to the competition between the Ruddlesden-Popper phases of strontium iridates (Srn+1IrnO3n+1), conventional PLD methods often result in mixed phases of Sr2IrO4 (n = 1), Sr3Ir2O7 (n = 2), and SrIrO3 (n = ∞). We have discovered that reduced PLD plume dimensions and slow deposition rates are the key for stabilizing pure Sr2IrO4 phase thin-films, identified by real-time in-situ monitoring of their optical spectra. …
Positive Exchange Bias In Epitaxial Permalloy/Mgo Integrated With Si (100), S. S. Rao, J. T. Prater, Fan Wu, S. Nori, D. Kumar, Lanping Yue, Sy_Hwang Liou, Jagdish Narayan
Positive Exchange Bias In Epitaxial Permalloy/Mgo Integrated With Si (100), S. S. Rao, J. T. Prater, Fan Wu, S. Nori, D. Kumar, Lanping Yue, Sy_Hwang Liou, Jagdish Narayan
Sy-Hwang Liou Publications
In magnetic random access memory (MRAM) devices, soft magnetic thin film elements such as permalloy (Py) are used as unit cells of information. The epitaxial integration of these elements with the technologically important substrate Si (100) and a thorough understanding of their magnetic properties are critical for CMOS-based magnetic devices. We report on the epitaxial growth of Ni82.5Fe17.5 (permalloy, Py) on Si (100) using a TiN/MgO buffer layer. Initial stages of growth are characterized by the formation of discrete islands that gradually merge into a continuous film as deposition times are extended. Interestingly, we find that the …
Activation Energy Of Surface Diffusion And Terrace Width Dynamics During The Growth Of In (4×3) On Si (100) - (2×1) By Femtosecond Pulsed Laser Deposition, M. A. Hafez, H. E. Elsayed-Ali
Activation Energy Of Surface Diffusion And Terrace Width Dynamics During The Growth Of In (4×3) On Si (100) - (2×1) By Femtosecond Pulsed Laser Deposition, M. A. Hafez, H. E. Elsayed-Ali
Electrical & Computer Engineering Faculty Publications
The nucleation and growth of indium on a vicinal Si (100) - (2×1) surface at high temperature by femtosecond pulsed laser deposition was investigated by in situ reflection high energy electron diffraction (RHEED). RHEED intensity relaxation was observed for the first ∼2 ML during the growth of In (4×3) by step flow. From the temperature dependence of the rate of relaxation, an activation energy of 1.4±0.2 eV of surface diffusion was determined. The results indicate that indium small clusters diffused to terrace step edges with a diffusion frequency constant of (1.0±0.1) × 1011 s-1. The RHEED specular …
Self-Assembly Of Ge Quantum Dots On Si(100)- 2×1 By Pulsed Laser Deposition, M. S. Hegazy, H. E. Elsayed-Ali
Self-Assembly Of Ge Quantum Dots On Si(100)- 2×1 By Pulsed Laser Deposition, M. S. Hegazy, H. E. Elsayed-Ali
Electrical & Computer Engineering Faculty Publications
Self-assembled Ge quantum dots are grown on Si(100)- 2×1 by pulsed laser deposition. The growth is studied by in situ reflection high-energy electron diffraction and postdeposition atomic force microscopy. After the completion of the wetting layer, transient hut clusters, faceted by different planes, are observed. When the height of these clusters exceeded a certain value, the facets developed into {305} planes. Some of these huts become {305}-faceted pyramids as the film mean thickness was increased. With further thickness increase, dome clusters developed on the expense of these pyramids. © 2005 American Institute of Physics. [DOI: 10.1063/1.1949285]