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Articles 31 - 33 of 33
Full-Text Articles in Nanoscience and Nanotechnology
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
Legacy Theses & Dissertations (2009 - 2024)
As the semiconductor industry continues scaling devices to smaller sizes, the need for next generation lithography technology for fabricating these small structures has always been at the forefront. Over the past few years, conventional optical lithography technology which has adopted a series of resolution enhancement techniques to support the scaling needs is expected to run out of steam in the near future. Extreme Ultra Violet lithography (EUVL) is being actively pursued by the semiconductor industry as one of the most promising next generation lithographic technologies. Most of the issues unique to EUVL arise from the use of 13.5 nm light …
Nanoabrasives Retention And Removal Mechanisms In Polyurethane Pads For Copper Cmp, Iftikhar Ul-Hasan
Nanoabrasives Retention And Removal Mechanisms In Polyurethane Pads For Copper Cmp, Iftikhar Ul-Hasan
Legacy Theses & Dissertations (2009 - 2024)
The continued reduction in integrated circuit (IC) feature size requires similar reductions in surface defectivity. A key source of surface defects in IC fabrication processes stems from nanoabrasives used in chemical-mechanical planarization (CMP) processing. During CMP processing, polished surfaces are more vulnerable to defects including scratching, nanoabrasive particle adhesion and nanoabrasive agglomerate adhesion. The removal of these nano-sized particles is a priority for the IC fabrication industry and is reflected in the 2008 ITRS defect budget. However, there is insufficient technical understanding regarding the retention of residual nanoabrasives on the surfaces of the CMP pad following a CMP process and …
Silver-Polyimide Nanocomposite Films: Single-Stage Synthesis And Analysis Of Metalized Partially-Fluorinated Polyimide Btda/4-Bdaf Prepared From Silver(I) Complexes, Joshua Erold Robert Abelard
Silver-Polyimide Nanocomposite Films: Single-Stage Synthesis And Analysis Of Metalized Partially-Fluorinated Polyimide Btda/4-Bdaf Prepared From Silver(I) Complexes, Joshua Erold Robert Abelard
Dissertations, Theses, and Masters Projects
No abstract provided.