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Full-Text Articles in Nanoscience and Nanotechnology
Design And Development Of Highly Active, Nanoengineered, Platinum Based Core-Shell Electrodes For Proton Exchange Membrane Fuel Cells, Seth Louis Knupp
Design And Development Of Highly Active, Nanoengineered, Platinum Based Core-Shell Electrodes For Proton Exchange Membrane Fuel Cells, Seth Louis Knupp
Legacy Theses & Dissertations (2009 - 2024)
Highly active nanoengineered core-shell electrocatalyst have a great potential to be used as fuel cell electrodes. They can alleviate problems related with commercial carbon supported platinum by simultaneously lowering cost while enhancing reaction kinetics and overall performance. More recently, use of nanoengineered core-shell electrode structures have showed their ability to enhance the stability and overall lifetime of the catalyst without sacrificing the electrode's performance. We studied the potential of using highly active core-shell nanoparticles supported on carbon nanomaterials as fuel cell electrodes.
Fabrication And Characterization Of Nanomaterials Grown By Electron Beam Induced Deposition Process, Juntao Li
Fabrication And Characterization Of Nanomaterials Grown By Electron Beam Induced Deposition Process, Juntao Li
Legacy Theses & Dissertations (2009 - 2024)
Platinum&ndash and tungsten&ndashcontaining materials were grown on bulk substrates from a variety of precursors including (CH3)3CH3C5H4Pt, W(CO)6, WF6, and Pt(PF3)4 in either a high vacuum dual beam focused ion beam/scanning electron microscope (FIB&ndashSEM) or an environmental scanning electron microscope (ESEM). The effects of deposition conditions on the growth kinetics, microstructure and composition of the grown materials, structural and chemical homogeneity of impurities inside the deposits as well as the resistivity were investigated.
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
Legacy Theses & Dissertations (2009 - 2024)
As the semiconductor industry continues scaling devices to smaller sizes, the need for next generation lithography technology for fabricating these small structures has always been at the forefront. Over the past few years, conventional optical lithography technology which has adopted a series of resolution enhancement techniques to support the scaling needs is expected to run out of steam in the near future. Extreme Ultra Violet lithography (EUVL) is being actively pursued by the semiconductor industry as one of the most promising next generation lithographic technologies. Most of the issues unique to EUVL arise from the use of 13.5 nm light …