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Electronic Devices and Semiconductor Manufacturing Commons™
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Full-Text Articles in Electronic Devices and Semiconductor Manufacturing
Optical And Electrical Analysis Of Zno/Znte Micropillar Solar Cells, Sadia Binte Sohid
Optical And Electrical Analysis Of Zno/Znte Micropillar Solar Cells, Sadia Binte Sohid
Master’s Theses
The prime focus of the energy-research community in recent times has been replacing fossil fuels with renewable energy. Therefore, photovoltaic research areas are rapidly expanding in this era. The purpose of this work is to compare three different structural ZnO/ZnTe solar cell types (planar, axial micropillar and radial micropillar). The best optical and electrical performance has been obtained by the radial junction (core-shell) ZnO/ZnTe micropillar solar cell due to its pillar structure and radial junction. The unique advantage of the radial junction micropillar is that the angle of the incident light and the carrier collection is orthogonal. Therefore, the pillar …
Modeling And Simulation Of 1700 V 8 A Genesic Superjunction Transistor, Staci E. Brooks
Modeling And Simulation Of 1700 V 8 A Genesic Superjunction Transistor, Staci E. Brooks
Graduate Theses and Dissertations
The first-ever 1.7kV 8A SiC physics-based compact SPICE model is developed for behavior prediction, modeling and simulation of the GeneSiC “Super” Junction Transistor. The model implements Gummel-Poon based equations and adds a quasi-saturation collector series resistance representation from a 1.2 kV, 6 A SiC bipolar junction transistor model developed in Hangzhou, China. The model has been validated with the GA08JT17-247 device data representing both static and dynamic characteristics from GeneSiC. Parameter extraction was performed in IC-CAP and results include plots showing output characteristics, capacitance versus voltage (C-V), and switching characteristics for 25 °C, 125 °C, and 175 °C temperatures.
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Electromagnetic Modeling Of Photolithography Aerial Image Formation Using The Octree Finite Element Method, Seth A. Jackson
Masters Theses 1911 - February 2014
Modern semiconductor manufacturing requires photolithographic printing of subillumination wavelength features in photoresist via electromagnetic energy scattered by complicated photomask designs. This results in aerial images which are subject to constructive and destructive wave interference, as well as electromagnetic resonances in the photomask features. This thesis proposes a 3-D full-wave frequency domain nonconformal Octree mesh based Finite Element Method (OFEM) electromagnetic scattering solver in combination with Fourier Optics to accurately simulate the entire projection photolithography system, from illumination source to final image intensity in the photoresist layer. A rapid 1-irregular octree based geometry model mesher is developed and shown to perform …