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Full-Text Articles in Plasma and Beam Physics

The Contribution Of Non-Thermal And Advanced Oxidation Technologies Towards Dissipation Of Pesticide Residues, N. Misra Jan 2015

The Contribution Of Non-Thermal And Advanced Oxidation Technologies Towards Dissipation Of Pesticide Residues, N. Misra

Articles

Background

The use of pesticides has stabilised the food production to a great extent and their usage cannot be avoided anymore. Nevertheless, common food processing operations always allowed dissipating pesticide residues in foods to some extent. Within the food science community and the food processing sector, non-thermal food technologies are being researched and commercialised at a great pace over the past three decades.

Scope and Approach

In this review we provide a critical analysis of the literature pertinent to the fate of pesticide residues during non-thermal processing of solid and liquid foods. We also identify the opportunities for further development …


In-Package Nonthermal Plasma Degradation Of Pesticides On Fresh Produce, N. Misra, Shashi Pankaj, Tony Walsh, Finbarr O'Regan, Paula Bourke, Patrick Cullen Feb 2014

In-Package Nonthermal Plasma Degradation Of Pesticides On Fresh Produce, N. Misra, Shashi Pankaj, Tony Walsh, Finbarr O'Regan, Paula Bourke, Patrick Cullen

Articles

In-package nonthermal plasma (NTP) technology is a novel technology for the decontamination of foods and biological materials. This study presents the first report on the potential of the technology for the degradation of pesticide residues. A cocktail of pesticides, namely Azoxystrobin, Cyprodinil, Fludioxonil and Pyriproxyfen was tested on strawberries. The concentrations of these pesticides were monitored in priori and post- plasma treatment using GC-MS/MS. An applied voltage and time dependent degradation of the pesticides was observed for treatment voltages of 60, 70 and 80 kV and treatment durations ranging from 1 to 5 min, followed by 24 h in-pack storage. …


Dc Pulsed Atmospheric Pressure Plasma Jet Image Information, Denis P. Dowling, F T. O'Neill, Vladimir Milosavljevic, Victor J. Law Nov 2011

Dc Pulsed Atmospheric Pressure Plasma Jet Image Information, Denis P. Dowling, F T. O'Neill, Vladimir Milosavljevic, Victor J. Law

Articles

This paper presents optical imaging and optical emission spectroscopy (OES) data of an atmospheric-pressure plasma jet. It is shown how the visual information and OES information of the air discharge are related as the blown arc extends from the nozzle (2-4 mm) with a molecular nitrogen rotational temperature on the order of 1700 K and the flowing afterglow beyond this region is dominated by the cooler (300-K) NO-O chemiluminescent reaction that produces NO2 species.


Hand-Held Flyback Driven Coaxial Dielectric Barrier Discharge: Development And Characterization, Victor J. Law, Vladimir Milosavljevic, Neil O’Connor, James F. Lalor, Steven Daniels Sep 2008

Hand-Held Flyback Driven Coaxial Dielectric Barrier Discharge: Development And Characterization, Victor J. Law, Vladimir Milosavljevic, Neil O’Connor, James F. Lalor, Steven Daniels

Articles

The development of a handheld single and triple chamber atmospheric pressure coaxial dielectric barrier discharge driven by Flyback circuitry for helium and argon discharges is described. The Flyback uses external metal-oxide-semiconductor field-effect transistor power switching technology and the transformer operates in the continuous current mode to convert a continuous dc power of 10–33 W to generate a 1.2–1.6 kV 3.5 μs pulse. An argon discharge breakdown voltage of ∼768 V is measured. With a 50 kHz, pulse repetition rate and an argon flow rate of 0.5–10 argon slm (slm denotes standard liters per minute), the electrical power density deposited in …


Real-Time Plasma Controlled Chemistry In A Two-Frequency, Confined Plasma Etcher, Vladimir Milosavljevic, Albert R. Ellingboe, Cezar Gaman, John V. Ringwood Apr 2008

Real-Time Plasma Controlled Chemistry In A Two-Frequency, Confined Plasma Etcher, Vladimir Milosavljevic, Albert R. Ellingboe, Cezar Gaman, John V. Ringwood

Articles

The physics issues of developing model-based control of plasma etching are presented. A novel methodology for incorporating real-time model-based control of plasma processing systems is developed. The methodology is developed for control of two dependent variables (ion flux and chemical densities) by two independent controls (27 MHz power and O2flow). A phenomenological physics model of the nonlinear coupling between the independent controls and the dependent variables of the plasma is presented. By using a design of experiment, the functional dependencies of the response surface are determined. In conjunction with the physical model, the dependencies are used to deconvolve the sensor …


Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels Nov 2007

Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels

Articles

This paper presents a method for precise measurement of atomic and molecular nitrogen in an oxygen-nitrogen dc plasma. This is achieved by monitoring the intensities of the atomic nitrogen spectral line at 821.6 nm and the molecular nitrogen bandhead at 337.1 nm, relative to the atomic oxygen spectral line at 844.7 nm. Oxygen is one of the most frequently used gases for surface chemical treatment, including deposition and etching, therefore the ability to measure and control the process and chemical composition of the process is essential. To validate this oxygen actimometry method for N2-xO2 (where x varies from 0 to …