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The University of Maine

Thin films

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Full-Text Articles in Inorganic Chemistry

Modification Of Semi-Metal Oxide And Metal Oxide Powders By Atomic Layer Deposition Of Thin Films, Mark Q. Snyder May 2007

Modification Of Semi-Metal Oxide And Metal Oxide Powders By Atomic Layer Deposition Of Thin Films, Mark Q. Snyder

Electronic Theses and Dissertations

This work describes two methods of modifying, and the subsequent characterizing of, oxide nanopowders. The first method, atomic layer deposition, or ALD, is a series of surface-limited reactions that are repeated to deposit a thin, inorganic film on the surface of the nanopowder. Deposition of a thin film is a useful method to alter the surface properties of a material while retaining its bulk properties. Part of this thesis concerns the understanding of the growth mechanism of thin film titanium nitride (a material known for thermal and chemical stability as well as electronic conductivity) on silica through the ALD process. …


Reactions Of Alcohols And Organophosphonates On Tungsten Trioxide Epitaxial Films, Shuguo Ma May 2003

Reactions Of Alcohols And Organophosphonates On Tungsten Trioxide Epitaxial Films, Shuguo Ma

Electronic Theses and Dissertations

The adsorption, diffusion, reactions, and desorption of water, alcohols, ethers, and an organophosphonate were studied using calibrated thermal desorption spectroscopy (CTDS) on thin film WO3(OOl) surfaces grown epitaxially on a single crystal α- Al2O3(li02) (sapphire) substrate. The studies were conducted on oxidized and reduced surfaces, which were characterized by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). The desorption spectra for molecular desorption of all of these molecules shifted to lower temperature with increasing coverage, and had overlapping tails on the high temperature side. Monte Carlo simulations show that this typical desorption shape …


Stabilization Of Rutile-Related Thin Film On Tio2 Substrates, Youngnam Cho Aug 2002

Stabilization Of Rutile-Related Thin Film On Tio2 Substrates, Youngnam Cho

Electronic Theses and Dissertations

Conducting metal oxide thin films are of broad interest because they have a wide variety of magnetic and electronic properties. Materials exist that range from superconducting to insulating, are ferromagnetic and are ferroelectric. These properties make thin conducting oxide films attractive for many industrial applications. A class of metal oxides exists that adapt the rutile crystal structure; the structure of the mineral rutile, TiO2. These metal oxides have the general formula MO2 where M is a metal cation of valence +4. Metal oxides crystallizing in the rutile structure also display a wide variety of physical properties. The …