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Full-Text Articles in Nanotechnology Fabrication
Wave-Shaped Mask Of Fabricating Nano-Scaled Structure, Fang-Tzu Chuang
Wave-Shaped Mask Of Fabricating Nano-Scaled Structure, Fang-Tzu Chuang
Fang-Tzu Chuang
A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
Method Of Fabricating A Polarized Color Filter, Fang-Tzu Chuang
Method Of Fabricating A Polarized Color Filter, Fang-Tzu Chuang
Fang-Tzu Chuang
A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A …
Method Of Fabricating Wave-Shaped Mask For Photolithography And Exposure Method Of Fabricating Nano-Scaled Structure Using The Wave-Shaped Mask, Fang-Tzu Chuang
Method Of Fabricating Wave-Shaped Mask For Photolithography And Exposure Method Of Fabricating Nano-Scaled Structure Using The Wave-Shaped Mask, Fang-Tzu Chuang
Fang-Tzu Chuang
A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent …