Electronic Devices and Semiconductor Manufacturing Commons^™

A Note From The Editor, Daphne Fauber

Ideas: Exhibit Catalog for the Honors College Visiting Scholars Series

This piece is a letter from Daphne Fauber, the editor of this issue of Ideas. In the letter, the editor introduces the work of Dr. Paschalis Gkoupidenis as well as the moment in time in which his Visiting Scholars talk occurs.

Engineering Electromagnetic Systems For Next-Generation Brain-Machine Interface, Brayan Ricardo Navarrete

FIU Electronic Theses and Dissertations

MagnetoElectric Nanoparticles (MENPs) are known to be a powerful tool for a broad range of applications spanning from medicine to energy-efficient electronics. MENPs allow to couple intrinsic electric fields in the nervous system with externally controlled magnetic fields. This thesis exploited MENPs to achieve contactless brain-machine interface (BMIs). Special electromagnetic devices were engineered for controlling the MENPs’ magnetoelectric effect to enable stimulation and recording. The most important engineering breakthroughs of the study are summarized below.

(I) Metastable Physics to Localize Nanoparticles: One of the main challenges is to localize the nanoparticles at any selected site(s) in the brain. The fundamental …

Arsenic Exposure And Methylation Efficiency In Relation To Oxidative Stress In Semiconductor Workers, Chih-Hong Pan, Ching-Yu Lin, Ching-Huang Lai, Hueiwang Anna Jeng

Community & Environmental Health Faculty Publications

This study examined associations between oxidative stress and arsenic (As) exposure and methylation efficiency in semiconductor workers. An As-exposed group (n = 427) and a control group (n = 91) were included. The As-exposure group (n = 427) included 149 maintenance staff members and 278 production staff members representing high As exposure and low As exposure, respectively. The control group included 91 administrative staff members with no or minimal As exposure. An occupational exposure assessment was conducted to assess personal As exposure by measuring As concentrations in urine, hair, and fingernails of the subjects. Urinary As(III), As(V), monomethylarsonic (MMA), and …