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Electrical and Computer Engineering Commons

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Electrical and Computer Engineering Publications

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Articles 301 - 302 of 302

Full-Text Articles in Electrical and Computer Engineering

Optical Modes Within Iii-Nitride Multiple Quantum Well Microdisk Cavities, R. A. Mair, K. C. Zeng, J. Y. Lin, H. X. Jiang, B. Zhang, L. Dai, A. Botchkarev, W. Kim, Hadis Morkoç, M. A. Khan Jan 1998

Optical Modes Within Iii-Nitride Multiple Quantum Well Microdisk Cavities, R. A. Mair, K. C. Zeng, J. Y. Lin, H. X. Jiang, B. Zhang, L. Dai, A. Botchkarev, W. Kim, Hadis Morkoç, M. A. Khan

Electrical and Computer Engineering Publications

Optical resonance modes have been observed in optically pumped microdisk cavitiesfabricated from 50 Å/50 Å GaN/AlxGa1−xN(x∼0.07) and 45 Å/45 Å InxGa1−xN/GaN(x∼0.15)multiple quantum well structures. Microdisks, approximately 9 μm in diameter and regularly spaced every 50 μm, were formed by an ion beametch process. Individual disks were pumped at 300 and 10 K with 290 nm laser pulses focused to a spot size much smaller than the disk diameter. Optical modes corresponding to (i) the radial mode type with a spacing of 49–51 meV (both TE and TM) and (ii) the Whispering Gallery mode with a spacing of 15–16 meV were …


Effect Of Ammonia Flow Rate On Impurity Incorporation And Material Properties Of Si-Doped Gan Epitaxial Films Grown By Reactive Molecular Beam Epitaxy, Wook Kim, A. E. Botchkarev, H. Morkoç, Z.-Q. Fang, D. C. Look, David J. Smith Jan 1998

Effect Of Ammonia Flow Rate On Impurity Incorporation And Material Properties Of Si-Doped Gan Epitaxial Films Grown By Reactive Molecular Beam Epitaxy, Wook Kim, A. E. Botchkarev, H. Morkoç, Z.-Q. Fang, D. C. Look, David J. Smith

Electrical and Computer Engineering Publications

Effect of ammonia flow rate on the impurity incorporation and material properties of Si-doped GaN films grown by reactive molecular beam epitaxy (RMBE) process is discussed. It appears that the ammonia flow rate has a marginal effect on the incorporation of impurities into the Si-doped GaN films except there was a little decrease in O and Si with increasing ammonia flow rate when the Si concentration in the film is higher than 1018 cm−3. Electron Hall mobility of Si-doped GaN films grown by RMBE varies with ammonia flow rate used during film growth. From deep level transient spectroscopy(DLTS) measurements for …