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Condensed Matter Physics Commons

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Plasma and Beam Physics

William & Mary

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Surface Processing By Rfi Pecvd And Rfi Psii, Lingling Wu Jan 2000

Surface Processing By Rfi Pecvd And Rfi Psii, Lingling Wu

Dissertations, Theses, and Masters Projects

An RFI plasma enhanced chemical vapor deposition (PECVD) system and a large-scale RF plasma source immersion ion implantation (PSII) system were designed and built to study two forms of 3-D surface processing, PECVD and PSII. Using the RFI PECVD system, Ti-6Al-4V substrates were coated with diamond-like carbon films with excellent tribological and optical properties. as an innovation, variable angle spectroscopic ellipsometry (VASE) was successfully applied for non-destructive, 3-D, large-area tribological coatings quality investigation.;Based on the experience with the RFI PECVD system, a large-scale RFICP source was designed and built for the PSIL Langmuir probe and optical emission spectroscopy studies indicated …