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Full-Text Articles in Atomic, Molecular and Optical Physics
Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels
Practical Sensor For Measurement Of Nitrogen, Dusan Popovic, Vladimir Milosavljevic, Steven Daniels
Articles
This paper presents a method for precise measurement of atomic and molecular nitrogen in an oxygen-nitrogen dc plasma. This is achieved by monitoring the intensities of the atomic nitrogen spectral line at 821.6 nm and the molecular nitrogen bandhead at 337.1 nm, relative to the atomic oxygen spectral line at 844.7 nm. Oxygen is one of the most frequently used gases for surface chemical treatment, including deposition and etching, therefore the ability to measure and control the process and chemical composition of the process is essential. To validate this oxygen actimometry method for N2-xO2 (where x varies from 0 to …
Optical Absorption, Depolarization, And Scatter Of Epitaxial Single-Crystal Chemical-Vapor-Deposited Diamond At 1.064 Μm, Giorgio Turri, Ying Chen, Michael Bass
Optical Absorption, Depolarization, And Scatter Of Epitaxial Single-Crystal Chemical-Vapor-Deposited Diamond At 1.064 Μm, Giorgio Turri, Ying Chen, Michael Bass
Publications
No abstract provided.
Optical Properties Of Epitaxial Single-Crystal Chemical-Vapor-Deposited Diamond, Giorgio Turri, Ying Chen, Michael Bass, David Orchard, James E. Butler
Optical Properties Of Epitaxial Single-Crystal Chemical-Vapor-Deposited Diamond, Giorgio Turri, Ying Chen, Michael Bass, David Orchard, James E. Butler
Publications
Epitaxial single-crystal chemical-vapor-deposited diamond was obtained from Element Six Ltd. (Ascot, UK) and from Apollo Diamond (Boston, MA). Both companies provided 5 x 5 mm squares with thicknesses ranging from 0.5 to 1.5 mm. In addition, Element Six provided 10-mm-diameter disks with a thickness of 1.0 mm. The absorptance of all specimens at 1064 nm was measured by laser calorimetry, with good agreement between independent measurements at the University of Central Florida and at QinetiQ (Malvern, UK). Depolarization at 1064 nm and ultraviolet absorption properties are also reported.
Simulation And Analysis Of Ultrafast Laser Pulse Induced Plasma Generation In Dielectric Materials, Jeremy Gulley, Sebastian Winkler, William Dennis
Simulation And Analysis Of Ultrafast Laser Pulse Induced Plasma Generation In Dielectric Materials, Jeremy Gulley, Sebastian Winkler, William Dennis
Jeremy R. Gulley
Recent experiments on optical damage by ultrashort laser pulses have demonstrated that the temporal pulseshape can dramatically influence plasma generation in fused silica and sapphire. In this work a modified 3+1D nonlinear Schroedinger equation for the pulse propagation coupled to a rate equation for the plasma density in the dielectric material is used to simulate pulse propagation and plasma formation in a range of dielectric materials. We use these simulations to analyze the influence of pulse-width, pulse-shape and beam geometry on the formation of the electron plasma and hence damage in the bulk material. In particular, when possible, we simulate …