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Analysis Of Adsorbed Contaminants Of Caf2 Surfaces By Infrared Laser Induced Desorption, Jinmei Fu, Yamini Surapaneni, Susan D. Allen
Analysis Of Adsorbed Contaminants Of Caf2 Surfaces By Infrared Laser Induced Desorption, Jinmei Fu, Yamini Surapaneni, Susan D. Allen
Susan D. Allen
157 nm photolithography technologies are currently under development and have been accepted as the leading candidate for fabrication of the next generation semiconductor devices after 193 nm. At this and shorter wavelengths, molecular contamination of surfaces becomes a serious problem as almost all molecules absorb at 157 nm and below. The light transmitted by a photolithographic tool can be significantly decreased by the presence of a few monolayers adsorbed on its many optical surfaces. We have developed a laser induced desorption, electron impact ionization, time-of-flight mass spectrometer (LID TOFMS) to study contaminants on 157nm and other ultraviolet optics, e.g., polished …
Alignment Memory Of A Nematic Liquid Crystal And Thermal Isotropization Of The Surface Adsorbed Layer, A. B. Nych, D. Yu. Reznikov, O. P. Boiko, V. G. Nazarenko, V. M. Pergamenshchik, Philip Bos
Alignment Memory Of A Nematic Liquid Crystal And Thermal Isotropization Of The Surface Adsorbed Layer, A. B. Nych, D. Yu. Reznikov, O. P. Boiko, V. G. Nazarenko, V. M. Pergamenshchik, Philip Bos
Philip J. Bos
We use a digital image analysis of the schlieren textures to study the effect of memory of the surface anisotropy in a nematic-liquid-crystal cell and establish its relation to the surface adsorbed molecular layer. The anisotropy is induced on an isotropic glass surface by a flow of the nematic liquid. The proposed technique allows us to quantify the alignment and its changes under the effect of temperature. The temperature at which the memory of the alignment texture is lost is interpreted as the temperature of the full isotropization of the initial anisotropic surface layer adsorbed during the flow: the molecules …
Analysis Of Adsorbed Contaminants Of Caf/Sub 2/ Surfaces By Infrared Laser Induced Desorption, Jinmei Fu, Yamini Surapaneni, Susan D. Allen
Analysis Of Adsorbed Contaminants Of Caf/Sub 2/ Surfaces By Infrared Laser Induced Desorption, Jinmei Fu, Yamini Surapaneni, Susan D. Allen
Mechanical Engineering - Daytona Beach
157 nm photolithography technologies are currently under development and have been accepted as the leading candidate for fabrication of the next generation semiconductor devices after 193 nm. At this and shorter wavelengths, molecular contamination of surfaces becomes a serious problem as almost all molecules absorb at 157 nm and below. The light transmitted by a photolithographic tool can be significantly decreased by the presence of a few monolayers adsorbed on its many optical surfaces. We have developed a laser induced desorption, electron impact ionization, time-of-flight mass spectrometer (LID TOFMS) to study contaminants on 157nm and other ultraviolet optics, e.g., polished …