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Full-Text Articles in Physics
Cavity Ringdown Spectroscopy In Nitrogen/Oxygen Mixtures In The Presence Of Alpha Radiation, Sidney John Gautrau
Cavity Ringdown Spectroscopy In Nitrogen/Oxygen Mixtures In The Presence Of Alpha Radiation, Sidney John Gautrau
Master's Theses
This research was part of an effort to experimentally validate computational models under development for radiation-induced atmospheric effects. Cavity Ringdown Spectroscopy (CRDS) was used to measure the concentration of chemical products generated as a result of radiation interactions in a controlled atmosphere. Experiments were conducted in a vacuum chamber interfaced with a gas introduction system that controlled the initial atmospheric composition. A quadrupole mass spectrometer and tunable dye laser were integrated to confirm initial atmospheric composition, and provide wavelength flexibility for detecting a variety of chemical products generated by radiation interactions. CRDS measurements were made for ozone production resulting from …
Direction Of Lead Diffusion In Geological Samples Using Rutherford Backscattering Sepctrometry, Andrew Mccalmont
Direction Of Lead Diffusion In Geological Samples Using Rutherford Backscattering Sepctrometry, Andrew Mccalmont
Honors Theses
A Rutherford Backscattering (RBS) analysis experiment was performed on several pyrrhotite samples in order to understand their lead (Pb) diffusive properties and determine the diffusion coefficients for Pb into the sample. The pyrrhotite samples were prepared at Rensselaer Polytechnic Institute and were subsequently annealed for one to several days at temperatures on the order of 500–800℃. A 1.1–MV Pelletron Accelerator in the Union College Ion Beam Analysis Laboratory was used to produce beams of 3.3–MeV alpha particles. The beam of alpha particles collided with the samples and the backscattered alpha particles’ energies were detected using a silicon surface barrier detector. …
Synthesis And Characterization Of Plasma Enhanced Chemically Vapor Deposited Tantalum Films, Weizhong Chen
Synthesis And Characterization Of Plasma Enhanced Chemically Vapor Deposited Tantalum Films, Weizhong Chen
Dissertations
A low temperature inorganic plasma-enhanced chemical vapor deposition (PECVD) process has been developed for the growth of Ta using tantalum pentachloride (TaC15) as the preferred precursor and hydrogen as the reactant gas. Ta coatings were deposited at substrate temperature of 370-400 °C, reactor working pressures of 0.7-2 Ton, hydrogen carrier flow rate of 10-20 sccm, hydrogen reactant flow rates of 500 sccm, and plasma power ranging from 60 to 100W. Ta coatings were characterized with respect to their chemical, structural, and morphological properties by Auger electron spectroscopy (AES), x-ray diffraction (XRD), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), scanning …