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Full-Text Articles in Physics
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Physics Faculty Publications
To study the quality of thin metal/ZnO Schottky contacts (SCs), temperature-dependent current-voltage (I-V), capacitance-voltage, deep level transient spectroscopy, and photoluminescence measurements were performed using bulk, vapor-phase ZnO, treated by remote oxygen plasma (ROP). Au/ZnO and Pd/ZnO contacts on both O and Zn faces are compared as a function of the ROP processing sequence and duration. We find that (i) as the duration of ROP treatment increases from 2 to 4 h, Au/ZnO contacts on the Zn face, deposited before ROP treatment, become rectifying, while those on the O face remain Ohmic; (ii) with long-term ROP …
Polarity-Related Asymetry At Zno Surfaces And Metal Interfaces, Y. F. Dong, Z-Q. Fang, David C. Look, Daniel R. Doutt, M. J. Hetzer, L. J. Brillson
Polarity-Related Asymetry At Zno Surfaces And Metal Interfaces, Y. F. Dong, Z-Q. Fang, David C. Look, Daniel R. Doutt, M. J. Hetzer, L. J. Brillson
Physics Faculty Publications
Clean ZnO (0001) Zn- and (000(/1)) O-polar surfaces and metal interfaces have been systematically studied by depth-resolved cathodoluminescence spectroscopy, photoluminescence, current-voltage and capacitance-voltage measurements, and deep level transient spectroscopy. Zn-face shows higher near band edge emission and lower near surface defect emission. Even with remote plasma decreases of the 2.5 eV near surface defect emission, (0001)-Zn face emission quality still exceeds that of (000(/1))-O face. The two polar surfaces and corresponding metal interfaces also present very different luminescence evolution under low-energy electron beam irradiation. Ultrahigh vacuum-deposited Au and Pd diodes on as-received and O2/He plasma-cleaned surfaces display not …
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
Physics Faculty Publications
In was implanted into bulk ZnO creating a square profile with a thickness of about 100 nm and an In concentration of about 1×1020 cm-3. The layer was analyzed with Rutherford backscattering, temperature-dependent Hall effect, and low-temperature photoluminescence measurements. The implantation created a nearly degenerate carrier concentration n of about 2×1019 cm-3, but with a very low mobility μ, increasing from about 0.06 cm2/V s at 20 K to about 2 cm2/V s at 300 K. However, after annealing at 600 °C for 30 min, n increased to about 5×10 …
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Physics Faculty Publications
Low-temperature photoluminescence (PL) and temperature-dependent Hall-effect (T-Hall) measurements were carried out in undoped and Ga-doped ZnO thin films grown by molecular-beam epitaxy. As the carrier concentration increases from 1.8×1018 to 1.8×1020 cm−3, the dominant PL line at 9 K changes from I1 (3.368–3.371 eV) to IDA (3.317–3.321 eV), and finally to I8 (3.359 eV). The dominance of I1, due to ionized-donor bound excitons, is unexpected in n-type samples but is shown to be consistent with the T-Hall results. We also show that IDA has characteristics of …
Ga-Doped Zno Films Grown On Gan Templates By Plasma-Assisted Molecular-Beam Epitaxy, H. J. Ko, Yanfang Chen, S. K. Hong, H. Wenisch, T. Yao, David C. Look
Ga-Doped Zno Films Grown On Gan Templates By Plasma-Assisted Molecular-Beam Epitaxy, H. J. Ko, Yanfang Chen, S. K. Hong, H. Wenisch, T. Yao, David C. Look
Physics Faculty Publications
We have investigated the structural and optical properties of Ga-doped ZnO films grown on GaN templates by plasma-assisted molecular-beam epitaxy. The carrier concentration in Ga-doped ZnO films can be controlled from 1.33×1018/cm3 to 1.13×1020/cm3. Despite high Ga incorporation, the linewidth of (0002) ω-rocking curves of Ga-doped ZnO films still lies in the range from 5 to 15 arc min. Photoluminescence (PL) spectra of Ga-doped ZnO films show dominant near-bandedge emission with negligibly weak deep-level emission, independent of carrier concentration. The PL spectrum exhibits a new emission line at 3.358 eV, which corresponds to …