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Full-Text Articles in Physics
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Physics Faculty Publications
High quality, bulk ZnO crystals grown by Tokyo Denpa using the hydrothermal process typically exhibit a room temperature carrier concentration in the 1013–1014 cm−3 range and a low mobility, conductive surface layer, observed at low temperature, with a sheet concentration on the order of 1012–1013 cm−2. In the sample discussed here, bulk conduction is controlled by two donor levels at 50 and 400 meV with concentrations of 1.2×1016 and 1.5×1016 cm−3, respectively. Temperature-dependent photo-Hall-effect measurements, using blue/UV light, in vacuum show an increase in the surface sheet …
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
Physics Faculty Publications
In was implanted into bulk ZnO creating a square profile with a thickness of about 100 nm and an In concentration of about 1×1020 cm-3. The layer was analyzed with Rutherford backscattering, temperature-dependent Hall effect, and low-temperature photoluminescence measurements. The implantation created a nearly degenerate carrier concentration n of about 2×1019 cm-3, but with a very low mobility μ, increasing from about 0.06 cm2/V s at 20 K to about 2 cm2/V s at 300 K. However, after annealing at 600 °C for 30 min, n increased to about 5×10 …
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Ga-Related Photoluminescence Lines In Ga-Doped Zno Grown By Plasma-Assisted Molecular-Beam Epitaxy, Z. Yang, David C. Look, J. L. Liu
Physics Faculty Publications
Low-temperature photoluminescence (PL) and temperature-dependent Hall-effect (T-Hall) measurements were carried out in undoped and Ga-doped ZnO thin films grown by molecular-beam epitaxy. As the carrier concentration increases from 1.8×1018 to 1.8×1020 cm−3, the dominant PL line at 9 K changes from I1 (3.368–3.371 eV) to IDA (3.317–3.321 eV), and finally to I8 (3.359 eV). The dominance of I1, due to ionized-donor bound excitons, is unexpected in n-type samples but is shown to be consistent with the T-Hall results. We also show that IDA has characteristics of …
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Physics Faculty Publications
Deep-level transient spectroscopy measurements of n-type GaN epitaxial layers irradiated with 1-MeV electrons reveal an irradiation-induced electron trap at EC−0.18 eV. The production rate is approximately 0.2 cm−1, lower than the rate of 1 cm−1 found for the N vacancy by Hall-effect studies. The defect trap cannot be firmly identified at this time. ©1998 American Institute of Physics.
Review Of Hall Effect And Magnetoresistance Measurements In Gaas Materials And Devices, David C. Look
Review Of Hall Effect And Magnetoresistance Measurements In Gaas Materials And Devices, David C. Look
Physics Faculty Publications
The use of magnetic fields in the electrical characterization of semiconductor materials is familiar to everyone in the form of Hall‐effect measurements. However, there is another magnetic‐field‐based phenomenon, magnetoresistance (MR), which is highly useful but not nearly so familiar to the majority of workers. One of the unique features of MR measurements is their applicability to common device structures, in particular, field‐effect transistors (FETs) and contact‐resistance patterns. We will show how channel mobility information can be extracted from the MR data in metal‐semiconductor FETs (MESFETs) and modulation‐doped heterostructure FETs (MODFETs), and also how the material under ohmic contacts can be …