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Full-Text Articles in Physics
Deep Traps In Algan/Gan Heterostructures Studied By Deep Level Transient Spectroscopy: Effect Of Carbon Concentration In Gan Buffer Layers, Z-Q. Fang, B. Claflin, David C. Look, D. S. Green, R. Vetury
Deep Traps In Algan/Gan Heterostructures Studied By Deep Level Transient Spectroscopy: Effect Of Carbon Concentration In Gan Buffer Layers, Z-Q. Fang, B. Claflin, David C. Look, D. S. Green, R. Vetury
Physics Faculty Publications
Electrical properties, including leakage currents, threshold voltages, and deep traps, of AlGaN/GaN heterostructure wafers with different concentrations of carbon in the GaN buffer layer, have been investigated by temperature dependent current-voltage and capacitance-voltage measurements and deep level transient spectroscopy (DLTS), using Schottky barrier diodes (SBDs). It is found that (i) SBDs fabricated on the wafers with GaN buffer layers containing a low concentration of carbon (low-[C] SBD) or a high concentration of carbon (high-[C] SBD) have similar low leakage currents even at 500 K; and (ii) the low-[C] SBD exhibits a larger (negative) threshold voltage than the high-[C] SBD. Detailed …
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Metal Contacts On Bulk Zno Crystal Treated With Remote Oxygen Plasma, Z-Q. Fang, B. Claflin, David C. Look, Y. F. Dong, L. Brillson
Physics Faculty Publications
To study the quality of thin metal/ZnO Schottky contacts (SCs), temperature-dependent current-voltage (I-V), capacitance-voltage, deep level transient spectroscopy, and photoluminescence measurements were performed using bulk, vapor-phase ZnO, treated by remote oxygen plasma (ROP). Au/ZnO and Pd/ZnO contacts on both O and Zn faces are compared as a function of the ROP processing sequence and duration. We find that (i) as the duration of ROP treatment increases from 2 to 4 h, Au/ZnO contacts on the Zn face, deposited before ROP treatment, become rectifying, while those on the O face remain Ohmic; (ii) with long-term ROP …
Polarity-Related Asymetry At Zno Surfaces And Metal Interfaces, Y. F. Dong, Z-Q. Fang, David C. Look, Daniel R. Doutt, M. J. Hetzer, L. J. Brillson
Polarity-Related Asymetry At Zno Surfaces And Metal Interfaces, Y. F. Dong, Z-Q. Fang, David C. Look, Daniel R. Doutt, M. J. Hetzer, L. J. Brillson
Physics Faculty Publications
Clean ZnO (0001) Zn- and (000(/1)) O-polar surfaces and metal interfaces have been systematically studied by depth-resolved cathodoluminescence spectroscopy, photoluminescence, current-voltage and capacitance-voltage measurements, and deep level transient spectroscopy. Zn-face shows higher near band edge emission and lower near surface defect emission. Even with remote plasma decreases of the 2.5 eV near surface defect emission, (0001)-Zn face emission quality still exceeds that of (000(/1))-O face. The two polar surfaces and corresponding metal interfaces also present very different luminescence evolution under low-energy electron beam irradiation. Ultrahigh vacuum-deposited Au and Pd diodes on as-received and O2/He plasma-cleaned surfaces display not …
Electron And Hole Traps In N-Doped Zno Grown On P-Type Si Substrate By Mocvd, Zhaoqiang Fang, Bruce B. Claflin, David C. Look, Lei L. Kerr, Xiaonan Li
Electron And Hole Traps In N-Doped Zno Grown On P-Type Si Substrate By Mocvd, Zhaoqiang Fang, Bruce B. Claflin, David C. Look, Lei L. Kerr, Xiaonan Li
Physics Faculty Publications
Electron and hole traps in N-doped ZnO were investigated using a structure of n+-ZnO:Al/i-ZnO/ZnO:N grown on a p-Si substrate by metalorganic chemical vapor deposition (for growth of the ZnO:N layer) and sputtering deposition (for growth of the i-ZnO and n+-ZnO:Al layers). Current-voltage and capacitance-voltage characteristics measured at temperatures from 200 to 400 K show that the structure is an abrupt n+−p diode with very low leakage currents. By using deep level transient spectroscopy, two hole traps, H3 (0.35 eV) and H4 (0.48 eV), are found in the p-Si …
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Electron-Irradiation-Induced Deep Level In N-Type Gan, Z-Q. Fang, Joseph W. Hemsky, David C. Look, M. P. Mack
Physics Faculty Publications
Deep-level transient spectroscopy measurements of n-type GaN epitaxial layers irradiated with 1-MeV electrons reveal an irradiation-induced electron trap at EC−0.18 eV. The production rate is approximately 0.2 cm−1, lower than the rate of 1 cm−1 found for the N vacancy by Hall-effect studies. The defect trap cannot be firmly identified at this time. ©1998 American Institute of Physics.