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Full-Text Articles in Nanoscience and Nanotechnology
Novel Resist Systems For Euv Lithography : Ler, Chain-Scission, Nanoparticle And More, Brian Cardineau
Novel Resist Systems For Euv Lithography : Ler, Chain-Scission, Nanoparticle And More, Brian Cardineau
Legacy Theses & Dissertations (2009 - 2024)
Extreme Ultraviolet (EUV) lithography is currently the best option for replacing 193-nm lithography in future IC fabrication. For EUV to be successful, however, there are a number of challenges that must be overcome. Current resist designs struggle to meet the demands of future lithography nodes. We propose the best way to overcome these obstacles is through the design of novel resist systems.
The Effect Of Energy Deposition On Pattern Resolution In Electron Beam Lithography, Ananthan Raghunathan
The Effect Of Energy Deposition On Pattern Resolution In Electron Beam Lithography, Ananthan Raghunathan
Legacy Theses & Dissertations (2009 - 2024)
Electron beam lithography is one of the most important tools for nanofabrication. Electron beam lithography has consistently been able to offer higher resolution, typically better than 10 nm or so, compared to other techniques. In this work the contribution of electron-substrate interaction to pattern resolution is investigated.
Local Area Mask Patterning Of Extreme Ultraviolet Lithography Reticles For Native Defect Analysis, Adam Lyons
Local Area Mask Patterning Of Extreme Ultraviolet Lithography Reticles For Native Defect Analysis, Adam Lyons
Legacy Theses & Dissertations (2009 - 2024)
Understanding the nature and behavior of native defects on EUV reticles, particularly their printability, is of critical importance to the successful implementation of EUV lithography for high volume manufacturing, as will be demonstrated in the upcoming chapters. Previous defect characterization work has focused on the examination of programmed defects, native defects on blank reticles, and unaligned native defects on patterned reticles. Each of these approaches has drawbacks, which will be discussed in detail, and the aim of this research is to address these deficiencies by developing a method to pattern features of interest over native defects, enabling the direct observation …