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Articles 1 - 5 of 5
Full-Text Articles in Nanoscience and Nanotechnology
Femtosecond Laser Patterned Templates And Imprinted Polymer Structures, Deepak Rajput
Femtosecond Laser Patterned Templates And Imprinted Polymer Structures, Deepak Rajput
Doctoral Dissertations
Femtosecond laser machining is a direct-write lithography technique by which user-defined patterns are efficiently and rapidly generated at the surface or within the bulk of transparent materials. When femtosecond laser machining is performed with tightly focused amplified pulses in single-pulse mode, transparent substrates like fused silica can be surface patterned with high aspect ratio (>10:1) and deep (>10 μm) nanoholes. The main objective behind this dissertation is to develop single-pulse amplified femtosecond laser machining into a novel technique for the production of fused silica templates with user-defined patterns made of high aspect ratio nanoholes. The size of the …
The Geometry And Sensitivity Of Ion-Beam Sculpted Nanopores For Single Molecule Dna Analysis, Ryan Connor Rollings
The Geometry And Sensitivity Of Ion-Beam Sculpted Nanopores For Single Molecule Dna Analysis, Ryan Connor Rollings
Graduate Theses and Dissertations
In this dissertation, the relationship between the geometry of ion-beam sculpted solid-state nanopores and their ability to analyze single DNA molecules using resistive pulse sensing is investigated. To accomplish this, the three dimensional shape of the nanopore is determined using energy filtered and tomographic transmission electron microscopy. It is shown that this information enables the prediction of the ionic current passing through a voltage biased nanopore and improves the prediction of the magnitude of current drop signals when the nanopore interacts with single DNA molecules. The dimensional stability of nanopores in solution is monitored using this information and is improved …
Fabrication Of Two-Dimensional Nanostructures On Glass Using Nanosphere Lithography, Elmer Jim Wang
Fabrication Of Two-Dimensional Nanostructures On Glass Using Nanosphere Lithography, Elmer Jim Wang
Wayne State University Theses
It is desired to have artificial optical materials with controllable optical properties. Optical glass is the most common optical material for various applications. This research will attempt to create a thin layer on the substrate with controllable optical properties. The thin layer is a composite material with nanoscale features and controllable refractive index. Two-dimensional (2D) nanostructures will be created on the surface of optical glass using nanosphere lithography. In comparison with conventional techniques, this approach is more efficient and cost-effective for the creation of large areas of thin surface layers as an artificial material. A uniform monolayer of nanospheres will …
Surface Plasmon Polaritons And Waveguide Modes At Structured And Inhomogeneous Surfaces, Javier Polanco
Surface Plasmon Polaritons And Waveguide Modes At Structured And Inhomogeneous Surfaces, Javier Polanco
Open Access Theses & Dissertations
In chapter 1, properties of a p-polarized surface plasmon polariton are studied, propagating circumferentially around a portion of a cylindrical interface between vacuum and a metal, a situation investigated earlier by M. V. Berry (J. Phys. A: Math. Gen. 8, (1975) 1952). When the metal is convex toward the vacuum this mode is radiative and consequently is attenuated as it propagates on the cylindrical surface. An approximate analytic solution of the dispersion relation for this wave is obtained by an approach different from the one used by Berry, and plots of the real and imaginary parts of its wave number …
Mueller Based Scatterometry And Optical Characterization Of Semiconductor Materials, Gangadhara Raja Muthinti
Mueller Based Scatterometry And Optical Characterization Of Semiconductor Materials, Gangadhara Raja Muthinti
Legacy Theses & Dissertations (2009 - 2024)
Scatterometry is one of the most useful metrology methods for the characterization and control of critical dimensions (CD) and the detailed topography of periodic structures found in microelectronics fabrication processes. Spectroscopic ellipsometry (SE) and normal incidence reflectometry (NI) based scatterometry are the most widely used optical methodologies for metrology of these structures. Evolution of better optical hardware and faster computing capabilities led to the development of Mueller Matrix (MM) based Scatterometry (MMS). Dimensional metrology using full Mueller Matrix (16 element) scatterometry in the wavelength range of 245nm-1000nm was discussed in this work. Unlike SE and NI, MM data provides complete …