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Study Of Nickel Silicide Formation By Physical Vapor Deposition Techniques, Shanti Pancharatnam
Study Of Nickel Silicide Formation By Physical Vapor Deposition Techniques, Shanti Pancharatnam
Legacy Theses & Dissertations (2009 - 2024)
Metal silicides are used as contacts to the highly n-doped emitter in photovoltaic devices. Thin films of nickel silicide (NiSi) are of particular interest for Si-based solar cells, as they form at lower temperature and consume less silicon. However, interfacial oxide limits the reduction in sheet resistance. Hence, different diffusion barriers were investigated with regard to optimizing the conductivity and thermal stability.