Mechanical Engineering Commons^™

Chemcial Vapor Deposition Precursor Chemistry. 5. The Photolytic Laser Deposition Of Aluminum Thin Films By Chemical Vapor Deposition, John A. Glass, Seong-Don Hwang, Saswati Datta, Brian W. Robertson, James T. Spencer

Department of Mechanical and Materials Engineering: Faculty Publications

Thin films of very high purity aluminum were formed from the laser photolysis of trimethylamine alane (TMAA) using both ultraviolet (pulsed nitrogen) and visible (argon ion) laser irradiation on a variety of substrates including gold. Si (111), GaAs (110) and Teflon (PTFE). At thicknesses of up to 1 μm, nearly linear growth rates of 377 Ås^-1 and 112 Ås^-1 were observed. The formation of volatile species formed during the deposition of aluminum from TMAA was investigated by quadrupole mass spectrometry (QMS) of the reactant gas stream. The highest intensity post-deposition mass fragments were observed at m/z 58, …