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Thin films

Nanomechanical Testing in Materials Research and Development V

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Full-Text Articles in Materials Science and Engineering

Mechanical And Optical Properties Of Silicon Nitride Thin Films On Glass, Lukas Simurka, Selen Erkam, Tuncay Turutoglu Oct 2015

Mechanical And Optical Properties Of Silicon Nitride Thin Films On Glass, Lukas Simurka, Selen Erkam, Tuncay Turutoglu

Nanomechanical Testing in Materials Research and Development V

Optical thin films have been widely used in glass coating industry for various energy saving applications such as solar control and low emissivity glasses. However, handling and processing of these systems can lead into various mechanical defects decreasing its lifetime and optical performance. Therefore, understanding and control of the mechanical properties plays an important role in thin films production. Silicon nitride is one of the most commonly used materials in the optical systems. Its high refractive index and good mechanical properties provide different functionalities. It can be used as a buffer layer for tuning of the optical performance or as …


Combining In Situ Tensile Testing And Orientation Microscopy In The Sem: A Mems Based Setup For Studying Time Dependent Deformation Of Thin Films By Tkd And Stem, Jan Philipp Liebig, Benoit Merle, Mathias Goken Oct 2015

Combining In Situ Tensile Testing And Orientation Microscopy In The Sem: A Mems Based Setup For Studying Time Dependent Deformation Of Thin Films By Tkd And Stem, Jan Philipp Liebig, Benoit Merle, Mathias Goken

Nanomechanical Testing in Materials Research and Development V

Structures in integrated devices are constantly subjected to residual or thermal stresses during operation. Understanding the relaxation behavior of thin films is therefore critical for improving their reliability.

Recently it was shown that Transmission Kikuchi Diffraction (TKD) in the Scanning Electron Microscope (SEM) enables the determination of local crystal orientations with high spatial resolution using standard Electron Backscatter Diffraction (EBSD) instrumentation [1, 2]. Giving access to quantitative information on mechanisms like grain growth, grain rotation and strain gradient evolution, time resolved TKD stands out as a promising technique for the characterization of microstructural changes upon relaxation of thin films.

We …