Materials Science and Engineering Commons^™

Thermal Atomic Layer Etching Of Mos2 Using Mof6 And H2O, Jake Soares, Anil U. Mane, Devika Choudhury, Steven Letourneau, Steven M. Hues, Jeffrey W. Elam, Elton Graugnard

Materials Science and Engineering Faculty Publications and Presentations

Two-dimensional (2D) layered materials offer unique properties that make them attractive for continued scaling in electronic and optoelectronic device applications. Successful integration of 2D materials into semiconductor manufacturing requires high-volume and high-precision processes for deposition and etching. Several promising large-scale deposition approaches have been reported for a range of 2D materials, but fewer studies have reported removal processes. Thermal atomic layer etching (ALE) is a scalable processing technique that offers precise control over isotropic material removal. In this work, we report a thermal ALE process for molybdenum disulfide (MoS₂). We show that MoF₆ can be used as …