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Theses

1996

Chemical vapor deposition.

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Full-Text Articles in Engineering Science and Materials

Fabrication Of Integrated Optic Sensor To Monitor Pollutant Concentration In Effluents, Kiran Chatty Oct 1996

Fabrication Of Integrated Optic Sensor To Monitor Pollutant Concentration In Effluents, Kiran Chatty

Theses

An attempt has been made to fabricate an integrated optic sensor to monitor pollutant concentration in effluents. Optic fiber has to be coupled to the waveguide in order to send light through the waveguide. In order to facilitate the easy coupling of the fiber to the waveguide, V-grooves were formed in the silicon substrate. In order to achieve this Silicon nitride was deposited to serve as an etch mask. An attempt was made to obtain low stress silicon nitride films.

This work also attempted to synthesize the materials required to fabricate the waveguide. LPCVD processes were developed to produce undoped …


Characterization Of Low Pressure Chemically Vapor Deposited Boron Nitride Films As Low Dielectric Constant Materials, Manish Narayan Jan 1996

Characterization Of Low Pressure Chemically Vapor Deposited Boron Nitride Films As Low Dielectric Constant Materials, Manish Narayan

Theses

Boron nitride thin films were synthesized on Si and quartz wafers by low pressure chemical vapor deposition using borane triethylamine complex and ammonia as precursors. The films were processed at 400°C, 475°C and 550°C at a constant pressure of 0.5 Torr and at different precursor flow ratios.

The films deposited were uniform, amorphous and the composition of the films varied with deposition temperature and precursor flow ratios. The thickness of the film increased with increasing flow ratio, but, decreased with increasing temperature. The stresses in the film were either mildly tensile or compressive.

The least dielectric constant for the films …