Engineering Science and Materials Commons^™

Development Of Low Temperature Alpha Alumina Coatings By Ac Magnetron Sputtering, Andrew Cloud

Mechanical Engineering Undergraduate Honors Theses

Alpha-phase aluminum oxide thin films were created using an Isoflux ICM-10 dual target inverted cylindrical magnetron sputtering system using mid-frequency AC power supplies. Alpha alumina films were deposited at a magnetron power of 6 kW, 50% oxygen partial pressure by volume, and -35 V DC bias. Film thickness, substrate material, and position and orientation within the deposition chamber were varied. To ensure the deposition conditions are suitable for alloys, the substrate temperature was measured using temperature indicating liquids. The experimental results, supported by Explicit Euler numerical analysis, revealed a steady state temperature of ~480°C at 6kW. Transmission electron microscopy (TEM) …