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Chemical Engineering Commons

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2004

Electrodeposition

Missouri University of Science and Technology

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Full-Text Articles in Chemical Engineering

Interfacial Stability Of Electrodeposition Of Cuprous Oxide Thin Films, Partho Neogi Nov 2004

Interfacial Stability Of Electrodeposition Of Cuprous Oxide Thin Films, Partho Neogi

Chemical and Biochemical Engineering Faculty Research & Creative Works

Experiments on deposition of Cu2O films from basic cupper sulfate solution show that copper also deposits. At low, but basic values of pH only copper deposits and at high pH only cuprous oxide deposits. In the intermediate range where both compete the system shows oscillations at "constant current." Linear stability analysis has been conducted for such an electrochemical cell to show that oscillations can take place in the parameter space identified in the experiments. The results are keeping with most of the experimental observations, which are many, but not with all. The physical mechanisms behind the oscillations are …