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2007

Diffusion

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Full-Text Articles in Physics

Experimental Study Of Profiles Of Implanted Species Into Semiconductor Materials Using Secondary Ion Mass Spectrometry, Fatma Salman Jan 2007

Experimental Study Of Profiles Of Implanted Species Into Semiconductor Materials Using Secondary Ion Mass Spectrometry, Fatma Salman

Electronic Theses and Dissertations

The study of impurity diffusion in semiconductor hosts is an important field that has both fundamental appeal and practical applications. Ion implantation is a good technique to introduce impurities deep into the semiconductor substrates at relatively low temperature and is not limited by the solubility of the dopants in the host. However ion implantation creates defects and damages to the substrate. Annealing process was used to heal these damages and to activate the dopants. In this study, we introduced several species such as alkali metals (Li, Na, K), alkali earth metals (Be, Ca,), transition metals (Ti, V, Cr, Mn) and …