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Effect Of Chemical Sputtering On The Growth And Structural Evolution Of Magnetron Sputtered Cnx Thin Films, Niklas Hellgren, Mats P.J Jõesaar, Esteban Broitman, Per Sandström, Lars Hultman, Jan-Eric Sundgren
Effect Of Chemical Sputtering On The Growth And Structural Evolution Of Magnetron Sputtered Cnx Thin Films, Niklas Hellgren, Mats P.J Jõesaar, Esteban Broitman, Per Sandström, Lars Hultman, Jan-Eric Sundgren
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The growth and microstructure evolution of carbon nitride CNx (0≤x≤0.35) films, deposited by reactive d.c. magnetron sputtering in Ar/N2 discharges has been studied. The substrate temperature TS varied between 100 and 550°C, and the N2 fraction in the discharge gas varied from 0 to 100%. It is found that the deposition rate and film morphology show strong dependence on TS and nitrogen fraction. For growth temperature of 100°C, the films are amorphous, and essentially unaffected by the nitrogen fraction. For TS>200°C, however, the nitrogen fraction has more significant effect on the growth and …