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Characterization Of Argon And Ar/Cl2 Plasmas Used For The Processing Of Niobium Superconducting Radio-Frequency Cavities, Jeremy J. Peshl

Physics Theses & Dissertations

The plasma processing of superconducting radio-frequency (SRF) cavities has shown significant promise as a complementary or possible replacement for the current wet etch processes. Empirical relationships between the user-controlled external parameters and the effectiveness of Reactive Ion Etching (RIE) for the removal of surface layers of bulk niobium have been previously established. However, a lack of a physical description of the etching discharge, particularly as the external parameters are varied, limits the development of this technology. A full understanding of how these external parameters affect both the amount of material removed and the physical properties of the plasma would aid …