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Articles 1 - 4 of 4
Full-Text Articles in Physics
Ruco To Extend The Scalability Of Ultra-Thin Direct Plate Liners, Daniel Verne Greenslit
Ruco To Extend The Scalability Of Ultra-Thin Direct Plate Liners, Daniel Verne Greenslit
Legacy Theses & Dissertations (2009 - 2024)
In traditional semiconductor technology a sputtered copper seed layer is used to improve the adhesion, microstucture, and electromigration characteristics of electrochemically deposited (ECD) copper. The seed layer is deposited on top of a Ta/TaN stack. The Ta layer acts as an adhesion and nucleation layer for the copper seed and the TaN serves as a diffusion barrier for the Cu. As the line widths continue to shrink, scaling each of these layers becomes more difficult. It would be advantageous for the interconnect to be composed of as much copper as possible, transitioning from the traditional liner seed stack to a …
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Legacy Theses & Dissertations (2009 - 2024)
Surface plasmon polariton (SPP) assisted photoelectron source array is proposed for use in distributed multiple electron beam lithography applications. Individual source is composed of a metal/dielectric surface structure with concentric circular grooves of subwavelength width surrounding a sub-wavelength aperture. Such optical power concentrators, called "plasmonic lenses", collect light incident over a broad area by converting it to surface electromagnetic waves, specifically SPP's, through diffraction by the sub-wavelength grooves surrounding the aperture. Through constructive interference of the generated SPPs between neighboring grooves, controlled by the periodicity of the grooves, high optical power densities can be achieved at the center of the …
White-Light And Infrared Emission From Sicxoy-Based Materials, Vasileios Nikas
White-Light And Infrared Emission From Sicxoy-Based Materials, Vasileios Nikas
Legacy Theses & Dissertations (2009 - 2024)
The development of a Si-based light source has attracted a high level of attention due to its potential unique advantages. For one, the monolithic integration of photonics on on-chip level along with the microelectronics devices would enhance the data processing rate. Additionally the cost per transmitted/processed information capacity can be significantly reduced.
Mueller Based Scatterometry And Optical Characterization Of Semiconductor Materials, Gangadhara Raja Muthinti
Mueller Based Scatterometry And Optical Characterization Of Semiconductor Materials, Gangadhara Raja Muthinti
Legacy Theses & Dissertations (2009 - 2024)
Scatterometry is one of the most useful metrology methods for the characterization and control of critical dimensions (CD) and the detailed topography of periodic structures found in microelectronics fabrication processes. Spectroscopic ellipsometry (SE) and normal incidence reflectometry (NI) based scatterometry are the most widely used optical methodologies for metrology of these structures. Evolution of better optical hardware and faster computing capabilities led to the development of Mueller Matrix (MM) based Scatterometry (MMS). Dimensional metrology using full Mueller Matrix (16 element) scatterometry in the wavelength range of 245nm-1000nm was discussed in this work. Unlike SE and NI, MM data provides complete …