Open Access. Powered by Scholars. Published by Universities.®
Nanoscience and Nanotechnology Commons™
Open Access. Powered by Scholars. Published by Universities.®
- Discipline
- Institution
Articles 1 - 2 of 2
Full-Text Articles in Nanoscience and Nanotechnology
The Characterization And Analysis Of In-Vitro And Elevated Temperature Repassivation Of Ti-6al-4v Via Afm Techniques, Aaron J. Guerrero
The Characterization And Analysis Of In-Vitro And Elevated Temperature Repassivation Of Ti-6al-4v Via Afm Techniques, Aaron J. Guerrero
Master's Theses
ABSTRACT
The Characterization and Analysis of In-vitro and Elevated Temperature Repassivation of
Ti-6Al-4V via AFM Techniques
Aaron J Guerrero
Research in the corrosion of orthopaedic implants is a growing research field where implants have been known to show adverse effects in patients who have encountered the unfortunate dissolution of their implants due to corrosion. Once corrosion begins within the body, many adverse biological reactions can occur such as late on-set infections resulting in severe health complications. The focus of this research is specifically related to the problem of late on-set infections caused by localized corrosion of orthopaedic implants. In medical …
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
A Study Of Reticle Non-Flatness Induced Image Placement Error In Extreme Ultraviolet Lithography, Sudharshanan Raghunathan
Legacy Theses & Dissertations (2009 - 2024)
As the semiconductor industry continues scaling devices to smaller sizes, the need for next generation lithography technology for fabricating these small structures has always been at the forefront. Over the past few years, conventional optical lithography technology which has adopted a series of resolution enhancement techniques to support the scaling needs is expected to run out of steam in the near future. Extreme Ultra Violet lithography (EUVL) is being actively pursued by the semiconductor industry as one of the most promising next generation lithographic technologies. Most of the issues unique to EUVL arise from the use of 13.5 nm light …