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Self-Assembly Of Block Copolymers By Solvent Vapor Annealing, Mechanism And Lithographic Applications, Xiaodan Gu
Self-Assembly Of Block Copolymers By Solvent Vapor Annealing, Mechanism And Lithographic Applications, Xiaodan Gu
Doctoral Dissertations
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdomains with sizes from 3 nm to about 50 nm making BCPs an appealing meso-scale material. In thin films, arrays of BCP microdomains with longrange lateral order can serve as ideal templates or scaffolds for patterning nano-scale functional materials and synthesizing nanostructured materials with size scales that exceed the reach of photolithography. Among many annealing methods, solvent vapor annealing (SVA) is a low-cost, highly efficient way to annihilate defects in BCP thin films and facilitates the formation of highly ordered microdomains within minutes. Directing the self-assembly …