VLSI and Circuits, Embedded and Hardware Systems Commons^™

Critical Area Driven Dummy Fill Insertion To Improve Manufacturing Yield, Nishant Dhumane

Masters Theses 1911 - February 2014

Non-planar surface may cause incorrect transfer of patterns during lithography. In today’s IC manufacturing, chemical mechanical polishing (CMP) is used for topographical planarization. Since polish rates for metals and oxides are different, dummy metal fills in layout is used to minimize post-CMP thickness variability. Traditional metal fill solutions focus on satisfying density target determined by layout density analysis techniques. These solutions may potentially reduce yield by increasing probability of failure (POF) due to particulate defects and also impact design performance. Layout design solutions that minimize POF and also improve surface planarity via dummy fill insertions have competing requirements for line …