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Ion Assisted Magnetron Sputtering Of Tantalum Thin Film Deposition And Characterization, Hua Ren

Dissertations

The purpose of this research was to investigate the effects of ion bombardment on the crystallographic phases of tantalum films during their deposition by magnetron sputtering process, and to gain understanding of the mechanism of the ion-solid interactions during the thin film growth. Tantalum (Ta) exists in two distinct crystallographic phases: a stable α-phase with a body centered cubic (bcc) lattice structure and a metastable β-phase with a tetragonal lattice structure. The tough and ductile α-phase Ta is desired in most industrial applications, such as diffusion barrier layers in integrated circuits, metallic corrosion protective layers, and in biomedical devices. The …

Formation Of Rdx Nanoparticles By Rapid Expansion Of Supercritical Solution : In Situ Characterization By Laser Scattering, Takuya Matsunaga

Dissertations

Cyclo-1,3,5-trimethylene-2,4,6-trinitramine (RDX), a well-known energetic material, is highly explosive. Reduction of the sensitivity of RDX is desired for safe handling and

storage in military applications. Data on the sensitivity of RDX in the 10-1000 µm crystal size range suggested that the impact sensitivity could be further reduced by reduction of the crystal size to the sub-micron or nano-scale (Armstrong, 1990). Recent research with nano-RDX obtained using Rapid Expansion of Supercritical Solutions (RESS) confirmed these expectations (Stepanov, 2005).

RESS process appeared to be one out of a few techniques of production of nanoscale energetic materials free of the risk of explosion. …