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High Temperature Nanoindentation Testing Of Amorphous Silicon Carbonitride Thin Films, Radim Ctvrtlik, Marwan Al-Haik, Valeriy Kilikovsky
High Temperature Nanoindentation Testing Of Amorphous Silicon Carbonitride Thin Films, Radim Ctvrtlik, Marwan Al-Haik, Valeriy Kilikovsky
Nanomechanical Testing in Materials Research and Development V
The mechanical properties of amorphous silicon carbonitride (SiCxNy) films with various nitrogen content (y = 0-40 at.%) were investigated in-situ at elevated temperatures up to 650 °C in inert atmosphere. The hardness and elastic modulus were evaluated using depth sensing nanoindentation with cubic boron nitride Berkovich indenter. Both the sample and indenter were separately heated during the experiments to temperatures 300, 500 and 650 °C. Short duration high temperature creep (1200 s) of the films was also investigated. The results revealed that the room temperature hardness and elastic modulus decline with the increase of the nitrogen …