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Full-Text Articles in Physics
Actinometry Of Hydrogen Plasmas, A. M. Cotter, James Doyle
Actinometry Of Hydrogen Plasmas, A. M. Cotter, James Doyle
Macalester Journal of Physics and Astronomy
Optical emission spectroscopy (OES) can be used to map the electron energy distribution of hydrogen plasmas. Using actinometry, a type of OES where trace amounts of noble gases are introduced, the effect of discharge power on the electron temperature of hydrogen plasmas was explored. This was done using argon and krypton as actinometers for low pressure hydrogen plasmas. It was determined that the electron temperature decreased with respect to power supplied to the discharge.
Power And Langmuir Probe Measurements Of H2 Rf Plasma, Alexander A. Stowell
Power And Langmuir Probe Measurements Of H2 Rf Plasma, Alexander A. Stowell
Macalester Journal of Physics and Astronomy
Methane based gases are often used to produce thin films of biomaterials, such as diamond-like carbon, through Plasma Enhanced Chemical Vapor Deposition. The characterization of the H2 plasma will give a deeper understanding of the physical processes occurring. Understanding these processes could lead to the optimization of the production of these thin films in the future. In this paper, we examine the H2 plasma using a Langmuir probe to gain information on the electron temperature and density of the plasma discharge. We measured electron temperatures of 6eV. Our Langmuir probe data indicates the electron temperature remains constant as …
Dissociative Excitation Of H2 In An Rf Plasma, John Carlson
Dissociative Excitation Of H2 In An Rf Plasma, John Carlson
Macalester Journal of Physics and Astronomy
Plasma-enhanced chemical vapor deposition is a widely used method for depositing thin films. In order to optimize the properties of the films, it is important to understand the plasma processes that occur during film growth. In this research we use optical emission spectroscopy in order to measure the spectral emission lines of a plasma produced with hydrogen gas. In conjunction with other measurements and modeling, these measurements can provide insight to the electron energy distribution of the plasma.
Langmuir Probe Measurements Of An Argon Plasma, Andrew B. Hansen
Langmuir Probe Measurements Of An Argon Plasma, Andrew B. Hansen
Macalester Journal of Physics and Astronomy
In the field of thin-film research, there exists a novel method of film growth called Plasma Enhanced Chemical Vapor Deposition or PECVD. This technique utilizes the energetic electrons released from a plasma discharge to help catalyze chemical reactions in the deposition chamber that are essential to the film-growth process. Because plasma dynamics are not very well understood, much research goes into developing techniques to characterize a plasma's properties. In our research, we examined techniques used to measure the current versus voltage characteristic of an Argon plasma by use of a Langmuir Probe with the ultimate goal of determining the plasma's …