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Molecular Beam Epitaxy Of High Mobility In0.75Ga0.25As For Electron Spin Transport Applications, Paul J. Simmonds, S. N. Holmes, H. E. Beere, I. Farrer, F. Sfigakis, D. A. Ritchie, M. Pepper
Molecular Beam Epitaxy Of High Mobility In0.75Ga0.25As For Electron Spin Transport Applications, Paul J. Simmonds, S. N. Holmes, H. E. Beere, I. Farrer, F. Sfigakis, D. A. Ritchie, M. Pepper
Paul J. Simmonds
The authors describe the molecular beam epitaxy of relaxed, nominally undoped In0.75Ga0.25As–In0.75Al0.25As quantum well structures grown on InP substrates. The maximum two-dimensional electron density is 2 × 1011cm−2, with a peak mobility of 2.2 × 105cm2 V−1s−1 at 1.5K. In high magnetic field, the electron g-factor was shown to have a magnitude of 9.1 ± 0.1 at Landau-level filling factor of 4. The Rashba coefficient, determined from the analysis of the magnetoresistance at high Landau-level filling factor (>12), …