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Reproducible Nanostructure Fabrication Using Atomic Force Microscopy Indentation With Minimal Tip Damage, Seunghee Jeon, Bongwoo Ryu, Wonho Jhe, Zheong G. Khim, Byung I. Kim

Physics Faculty Publications and Presentations

A uniform pattern of quantum dots and nanowires were reproducibly fabricated by creating holes in a two-layer structure using atomic force microscopy (AFM) indentation, dry-etching of polymer resists, and metal deposition through the indentation holes. The two-layer structure was created by depositing a thin gold layer onto a polymethyl methacrylate (PMMA) layer on a silicon substrate. The indentation depth was set so that the AFM tip penetrated the thin gold layer without the tip contacting the silicon substrate. This two-layer indentation was used to create a pattern of holes in the thin gold layer. Then, the PMMA was exposed to …