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Ultrahigh Vacuum Chamber For Synchrotron X-Ray Diffraction From Films Adsorbed On Single-Crystal Surfaces, John R. Dennison, S. K. Wang, P. Dai, T. Angot, H. Taub, S. N. Ehrlich

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An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single‐crystal surfaces using synchrotron x‐ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four‐axis diffractometer and can also be used independently of the x‐ray diffractometer. A low‐current, pulse‐counting, low‐energy electron diffraction/Auger spectroscopy system with a position‐sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x‐ray scattering position. A closed‐cycle He refrigerator and electron bombardment heater provide controlled …