Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 2 of 2
Full-Text Articles in Physics
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Thermal Stress Analysis, A. Ballantyne, H.A. Hyman, Clive L. Dym, R.C. Southworth
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Thermal Stress Analysis, A. Ballantyne, H.A. Hyman, Clive L. Dym, R.C. Southworth
All HMC Faculty Publications and Research
This paper examines the effects of thermal loading and time history upon the thermal stresses developed in lithographic mask structures as would be expected under irradiation by intense soft x rays. The objective of this work was to examine the phenomenology of the interaction and to evaluate the limits placed upon mask dosage. The mechanics of mask failure are examined in terms of single pulse and cumulative, or fatigue, effects. A number of prototypical mask structures are investigated, which show that the application of intense pulsed sources to x‐ray lithography does not reduce the potential utility of the techique. However, …
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Dynamic Response, Clive L. Dym, A. Ballantyne
Response Of Lithographic Mask Structures To Repetitively Pulsed X-Rays: Dynamic Response, Clive L. Dym, A. Ballantyne
All HMC Faculty Publications and Research
This paper addresses the issue of the dynamic response of thin lithographic mask structures to thermally induced stress fields. In particular, the impact of repetitively pulsed x‐ray sources are examined: the short duration (1–100 nsec) pulses induce large step changes in mask temperatures, which can, in turn, induce a dynamic response. The impact of conductive cooling of the mask is to reduce the repetitively pulsed problem to a series of isolated nearly identical thermal impulses of duration approximately equal to the cooling time. The importance of self‐weight and prestress is examined, and an analysis of the nonlinear dynamic response to …