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Stable Highly Conductive Zno Via Reduction Of Zn Vacancies, David C. Look, Timothy C. Droubay, Scott A. Chambers
Stable Highly Conductive Zno Via Reduction Of Zn Vacancies, David C. Look, Timothy C. Droubay, Scott A. Chambers
Physics Faculty Publications
Growth of Ga-doped ZnO by pulsed laser deposition at 200 °C in an ambient of Ar and H2produces a resistivity of 1.5 × 10−4 Ω-cm, stable to 500 °C. The resistivity can be further reduced to 1.2 × 10−4 Ω-cm by annealing on Zn foil, which reduces the compensating Zn-vacancy acceptor concentration NA to 5 × 1019 cm−3, only 3% of the Ga-donor concentration ND of 1.6 × 1021 cm−3, with ND and NA determined from a degenerate mobility theory. The plasmon-resonance wavelength is only 1060 …
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Uv Light-Induced Changes To The Surface Conduction In Hydrothermal Zno, B. Claflin, David C. Look
Physics Faculty Publications
High quality, bulk ZnO crystals grown by Tokyo Denpa using the hydrothermal process typically exhibit a room temperature carrier concentration in the 1013–1014 cm−3 range and a low mobility, conductive surface layer, observed at low temperature, with a sheet concentration on the order of 1012–1013 cm−2. In the sample discussed here, bulk conduction is controlled by two donor levels at 50 and 400 meV with concentrations of 1.2×1016 and 1.5×1016 cm−3, respectively. Temperature-dependent photo-Hall-effect measurements, using blue/UV light, in vacuum show an increase in the surface sheet …
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
Physics Faculty Publications
In was implanted into bulk ZnO creating a square profile with a thickness of about 100 nm and an In concentration of about 1×1020 cm-3. The layer was analyzed with Rutherford backscattering, temperature-dependent Hall effect, and low-temperature photoluminescence measurements. The implantation created a nearly degenerate carrier concentration n of about 2×1019 cm-3, but with a very low mobility μ, increasing from about 0.06 cm2/V s at 20 K to about 2 cm2/V s at 300 K. However, after annealing at 600 °C for 30 min, n increased to about 5×10 …
Electrical Characterization Of Ion Implantation Into Gaas, David C. Look
Electrical Characterization Of Ion Implantation Into Gaas, David C. Look
Physics Faculty Publications
Recent advances in the characterization of ion‐implanted samples have included whole wafer mapping (topography) and depth profiling techniques. We review several methods for mapping electrical parameters, including the dark‐spot resistance (DSR), and the microwave photoconductance techniques. In addition, we suggest a new photo‐Hall technique which would allow mobility and carrier‐concentration mapping as well as that of resistivity . Finally, we review methods for obtaining ρ, μ, and depth profiles, with particular emphasis on the application of the magnetoresistance techniques in actual field‐effect transistor structures.