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Xrd, Xps, And Optical Characterizations Of Al-Doped Zno Film Grown On Gaas Substrate, Ebru Şenadim Tüzemen, Hülya Şahi̇n, Kamuran Kara, Sezai̇ Elagöz, Ramazan Esen
Xrd, Xps, And Optical Characterizations Of Al-Doped Zno Film Grown On Gaas Substrate, Ebru Şenadim Tüzemen, Hülya Şahi̇n, Kamuran Kara, Sezai̇ Elagöz, Ramazan Esen
Turkish Journal of Physics
A ZnO:Al (10%) thin film was prepared on GaAs(100) substrate by using a pulsed filtered cathodic vacuum arc deposition (PFCVAD) system. The ZnO:Al thin film was thermally annealed for 1 h at 2 different temperatures in air. The film structure was investigated as a function of annealing temperature by X-ray diffraction (XRD). ZnO:Al film annealed at 500 °C by PFCVAD method resulted in an amorphous film. However, after annealing ZnO:Al film at 600 °C, it showed (100) and (002) peaks at around 32° and 34°, respectively. The chemical state of ZnO:Al (AZO) film on GaAs substrate was investigated by using …