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Full-Text Articles in Physics
Dissociative Excitation Of H2 In An Rf Plasma, John Carlson
Dissociative Excitation Of H2 In An Rf Plasma, John Carlson
Macalester Journal of Physics and Astronomy
Plasma-enhanced chemical vapor deposition is a widely used method for depositing thin films. In order to optimize the properties of the films, it is important to understand the plasma processes that occur during film growth. In this research we use optical emission spectroscopy in order to measure the spectral emission lines of a plasma produced with hydrogen gas. In conjunction with other measurements and modeling, these measurements can provide insight to the electron energy distribution of the plasma.
Kinetics Of Solid Phase Crystallization Of A-Ge Thin Films, John D. Graham
Kinetics Of Solid Phase Crystallization Of A-Ge Thin Films, John D. Graham
Macalester Journal of Physics and Astronomy
A method was developed to investigate the solid-phase crystallization (SPC) reaction undergone by germanium thin films. Amorphous films were grown by the radio-frequency (RF) magnetron sputtering and then annealed for a maximum of 6 hours at two temperatures: 446°C and 460°C. Crystallinity was measured by resistivity measurements, as well as crystal peak height and area taken from X-ray diffractometer (XRD) data. Initial data shows qualitative agreement with a nucleation-growth model for the observed kinetic process. However, observed peak narrowing phenomena suggests a comprehensive model of XRD measurements of polycrystalline thin films is needed for a rigorous interpretation of the results.