Physics Commons^™

Deposition Of Zinc Selenide By Atomic Layer Epitaxy For Multilayer X-Ray Optics, J.K. Shurtleff, David D. Allred, R. T. Perkins, J. M. Thorne

Faculty Publications

Thin film deposition techniques currently being used to produce multilayer x-ray optics (MXOs) have difficulty producing smooth, uniform multilayers with d-spacings less than about twelve angstroms. We are investigating atomic layer epitaxy (ALE) as an alternative to these techniques. ALE is a chemical vapor deposition technique which deposits an atomic layer of material during each cycle of the deposition process. The thickness of a film deposited by ALE depends only on the number of cycles. Multilayers deposited by ALE should be smooth and uniform with precise d-spacings which makes ALE an excellent technique for producing multilayer x-ray optics. We have …