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Full-Text Articles in Physics
Study Of The Strength Characteristics And Radiation Resistance Of Thin-Film Coatings Based On Cux (X=Bi, Mg, Ni), D. I. Shlimas, A. L. Kozlovskiy, M. E. Kaliekperov, K. K. Kadyrzhanov, V. V. Uglov
Study Of The Strength Characteristics And Radiation Resistance Of Thin-Film Coatings Based On Cux (X=Bi, Mg, Ni), D. I. Shlimas, A. L. Kozlovskiy, M. E. Kaliekperov, K. K. Kadyrzhanov, V. V. Uglov
Eurasian Journal of Physics and Functional Materials
The paper presents the results of changes in the strength characteristics of thin film coatings based on compounds of copper-bismuth, copper-magnesium, copper-nickel. The dependences of the influence of the phase composition on the strength characteristics, such as the coefficient of friction, bending strength and impact coefficient, are established. The effect of irradiation with helium ions with a high radiation dose of 1015-1017 ion/cm2 on the strength characteristics is evaluated. It is shown that an increase in the radiation dose leads to a decrease in strength properties due to the appearance of a large concentration of defects …
Fabrication Of Nanoscale Columnar Diodes By Glancing Angle Deposition, Jacob D. Weightman
Fabrication Of Nanoscale Columnar Diodes By Glancing Angle Deposition, Jacob D. Weightman
Macalester Journal of Physics and Astronomy
Glancing angle deposition (GLAD) is a process in which thin films are deposited onto a substrate with obliquely incident vapor together with precisely controlled azimuthal substrate rotation. Ballistic shadowing effects due to the oblique incidence produce nanoscale structures, and a variety of feature shapes, including tilted columns, helices, and vertical columns can be achieved by varying the azimuthal rotation during the deposition process. Due to this control of morphology and the compatibility of the process with a wide variety of materials, GLAD films have found applications in a variety of fields including sensing, photonics, photovoltaics, and catalysis, where they are …
Structural Behavior Of Rf Magnetron Sputtered Cupric Oxide (Cuo) Films, Ali Nadhim Khilkhal, Abdalhussain A. Khadayeir
Structural Behavior Of Rf Magnetron Sputtered Cupric Oxide (Cuo) Films, Ali Nadhim Khilkhal, Abdalhussain A. Khadayeir
Al-Qadisiyah Journal of Pure Science
In this paper a CuO thin film, has been deposited using RF sputtering technique, then the thin film has been characterized by XRD, result obtained showed that strongest peak was 48.6503 degree, and FWHM was 0.145 degree, while lattice constant was 4.65 Aº, and the average grain size was 62.78 nm. While AFM analysis showed that the increasing of another four samples temperature led to increase of roughness average from (3.77 to 15.7) nm, root mean square from (4.66 to 18.8) nm and ten points height from (22.6 to 52.6) at 250,300,350 and 400 C respectively. On the other hand …